About: Study of hybrid deposition process and its application for thin film deposition

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Projekt, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	http://linked.opendata.cz/ontology/domain/vavai/Projekt
rdfs:seeAlso	http://www.isvav.cz/projectDetail.do?rowId=GP202/08/P038
Description	This project focuses on investigation of behaviour of hybrid PVD-PECVD process, which will be used for preparation of nanocomposite n-Ti:C/a-C:H and a-BCN:H materials. In this hybrid deposition process, a gaseous hydrocarbon will be used as a source of carbon instead of its conventional sputtering from magnetron target. Hysteresis behaviour of this process together with properties of deposited thin films will be investigated and compared with those of PVD process. Comparative study for two types of hydrocarbons will be performed. Advanced model of reactive sputtering assuming nonuniform discharge current density will be developed. This model will be extended to accommodate the interaction of gaseous hydrocarbon with all surfaces in the deposition (en) Tento projekt je zaměřen na studium chování hybridního PVD-PECVD procesu, který bude využit pro přípravu nanokompozitních n-Ti:C/a-C:H a a-BCN:H materiálů. Jako zdroj uhlíku pro přípravu tenkých vrstev bude použit některý z plynných uhlovodíků dodávaný přímo do depozičního reaktoru, který zcela nahradí tradiční rozprašování uhlíkového terče. Hysterezní chování tohoto depozičního procesu a vlastnosti jím připravených vrstev budou srovnány s PVD procesem. Bude provedena srovnávací studie pro různé druhy uhlovodíků. Na základě provedených experimentů bude vylepšen stávající model reaktivního magnetronového naprašování. Tento model bude pracovat s nerovnoměrným tvarem hustoty výbojového proudu a bude rozšířen o interakci plynného uhlovodíku s povrchem magnetronové katody a stěnami depozičního reaktoru.
Title	Study of hybrid deposition process and its application for thin film deposition (en) Studium chování hybridního depozičního procesu a jeho využití pro přípravu tenkých vrstev
skos:notation	GP202/08/P038
http://linked.open...avai/cep/aktivita	Post-graduate (doctorate) grants
http://linked.open...kovaStatniPodpora	http://linked.opendata.cz/resource/domain/vavai/projekt/GP202%2F08%2FP038/celkovaStatniPodpora
http://linked.open...ep/celkoveNaklady	http://linked.opendata.cz/resource/domain/vavai/projekt/GP202%2F08%2FP038/celkoveNaklady
http://linked.open...datumDodatniDoRIV	2015-03-20 (xsd:date)
http://linked.open...i/cep/druhSouteze	VS - Veřejná soutěž ve výzkumu a vývoji
http://linked.open...ep/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open.../cep/fazeProjektu	82381394
http://linked.open...ai/cep/hlavniObor	BL - Fyzika plasmatu a výboje v plynech
http://linked.open...hodnoceniProjektu	V - Vynikající výsledky (s mezinárodním významem apod.). Zároveň byly splněny cíle a předpokládané výsledky uvedené ve smlouvě / rozhodnutí o poskytnutí podpory.
http://linked.open...vai/cep/kategorie	ZV - Základní výzkum
http://linked.open.../cep/klicovaSlova	magnetron sputtering; hybrid PVD-PECVD; hysteresis behaviour; thin film deposition; nanocomposite; BCN (en)
http://linked.open...ep/partnetrHlavni	Přírodovědecká fakulta
http://linked.open...inujicichPrijemcu	0 (xsd:int)
http://linked.open...cep/pocetPrijemcu	1 (xsd:int)
http://linked.open...ocetSpoluPrijemcu	0 (xsd:int)
http://linked.open.../pocetVysledkuRIV	34 (xsd:int)
http://linked.open...enychVysledkuVRIV	34 (xsd:int)
http://linked.open...lneniVMinulemRoce	2010-04-16 (xsd:date)
http://linked.open.../prideleniPodpory	http://linked.opendata.cz/resource/domain/vavai/cep/prideleniPodpory/202%2F08%2FP038
http://linked.open...iciPoslednihoRoku	2010
http://linked.open...atUdajeProjZameru	2011
http://linked.open.../vavai/cep/soutez	SGA02008GA1PD
http://linked.open...usZobrazovaneFaze	DUU
http://linked.open...ai/cep/typPojektu	P - Projekt výzkumu a vývoje financovaný ze státního rozpočtu
http://linked.open...ep/ukonceniReseni	2010-12-31 (xsd:date)
http://linked.open...ep/zahajeniReseni	2008-01-01 (xsd:date)
http://linked.open...jektu+dodavatelem	V rámci řešení projektu byl vyvinut hybridní PVD-PECVD proces, kdy dva konkurenční procesy přípravy tenkých vrstev – magnetronové naprašování a PECVD – byly provozovány současně. Bylo studováno chování tohoto hybridního procesu, kdy magnetronový terč byl rozprašován ve směsi obsahující plynný uhlovodík. Studovaný hybridní depoziční proces nevykazoval hysterezní chování, které je typické pro rea (cs) Hybrid PVD-PECVD process of target sputtering in hydrocarbon containing atmosphere was successfully developed. The process combines aspects of both conventional reactive magnetron sputtering (PVD) and plasma enhanced chemical vapour deposition (PECVD). Comparing to reactive magnetron sputtering, the hybrid PVD-PECVD process shows suppressed hysteresis behaviour, there are no different modes of op (en)
http://linked.open...tniCyklusProjektu	ZBKU
http://linked.open.../cep/klicoveSlovo	magnetron sputtering hybrid PVD-PECVD hysteresis behaviour nanocomposite thin film deposition
is http://linked.open...vavai/riv/projekt of	Experimental study of hybrid PVD-PECVD process of metallic target sputtering in argon and acetylene Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene Behaviour of Hybrid PVD-PECVD in Comparison with Conventional Reactive Magnetron Sputtering. Depth profile analyses of nc-TiC/a-C:H coating prepared by balanced magnetron sputtering Harmonic analysis of discharge voltages as a tool to control RF sputtering deposition process Measurement of Fundamental and Higher Harmonic Frequencies as Tool to Control RF Sputtering Deposition Process Role of Neutral Gas Temperature on Hysteresis Behaviour of Reactive Sputtering Deposition Process Modeling of Radial Variation of Target Poisoning During Reactive Sputtering Deposition Process Advanced modeling of reactive sputtering process with non-linear discharge current density Influence of N2 and CH4 on depositon rate of boron based thin films prepared by magnetron sputtering Higher harmonic frequencies of discharge voltages as extremely sensitive marker of state of RF reactive sputtering deposition process Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process Modelling of surface processes taking place during reactive magnetron sputtering deposition process with simultaneous adding of hydrogen and oxygen Is it possible to control degree of target poisoning during RF reactive magnetron sputtering by higher harmonic frequencies of discharge voltage? Hybrid PVD-PECVD sputtering deposition process - from properties of deposited films to process characteristics Modelling of the reactive sputtering process with non-uniform discharge current density and different temperature conditions Impact of neutral gas temperatures on reactive magnetron sputtering Preparation of self-adhesive nc-TiC/a-C:H coatings Behaviour of hybrid PVD-PECVD process of Ti sputtering in argon and acetylene atmosphere Deposition and characterization of nc-TiC/a-C:H coatings prepared by hybrid PVD-PECVD Monitoring of magnetron target poisoning by measurement of higher harmonics of discharge voltages Higher harmonic frequencies in capacitive discharges Higher harmonic frequencies in capacitive discharges Behaviour of Hybrid PVD-PECVD Process in Comparison with Conventional Reactive Magnetron Sputtering Monitoring of PVD, PECVD and etching plasmas using Fourier components of RF voltage Hybrid PVD-PECVD process: focusing on modelling and steady-state conditions Modeling of reactive magnetron sputtering deposition process - different target utilization, situation when O2 and H2 are added simultaneously Suppressed hysteresis behaviour of titanium sputtering in acetylene gas. Diagnostics of reactive magnetron sputtering Deposition and characterization of n-TiC/a-C:H coatings prepared by hybrid PVD-PECVD Deposition and analyses of nc-TiC/a-C:H coating prepared by balanced magnetron sputtering Suppressed hysteresis behaviour of Ti sputtering in acetylene gas Higher harmonics of discharge voltage as tool to control accurately state of RF sputtering deposition process Reactive magnetron sputtering - modelling of different target utilization in metallic and compound mode and situation when oxygen and hydrogen are added simultaneously
is http://linked.open...vavai/cep/projekt of	http://linked.opendata.cz/resource/domain/vavai/cep/ucast/GP202%2F08%2FP038/2008/orjk%3A14310 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/GP202%2F08%2FP038/2009/orjk%3A14310 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/GP202%2F08%2FP038/2010/orjk%3A14310 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/GP202%2F08%2FP038/2011/orjk%3A14310

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