About: Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Hybrid PVD–PECVD process of target sputtering in hydrocarbon containing atmosphere combines aspects of both conventional reactive magnetron sputtering (PVD) and plasma enhanced chemical vapour deposition (PECVD). Such process is being typically used for deposition of metal carbides embedded in hydrogenated carbon matrix. Compared to the conventional co-sputtering of metal and carbon targets, in the hybrid deposition process the source of the carbon is dissociated hydrocarbon vapour in plasma. The aim of this paper is to study the extent of similarities or differences between this hybrid process and the conventional reactive magnetron sputtering. We have chosen the sputtering of titanium target in acetylene containing atmosphere as a representative of the hybrid processes. We focused on experimental measurements of the hybrid PVD–PECVD process behaviour, the time necessary for the process to achieve steady-state conditions and basic modelling of the process. Hybrid PVD–PECVD process of target sputtering in hydrocarbon containing atmosphere combines aspects of both conventional reactive magnetron sputtering (PVD) and plasma enhanced chemical vapour deposition (PECVD). Such process is being typically used for deposition of metal carbides embedded in hydrogenated carbon matrix. Compared to the conventional co-sputtering of metal and carbon targets, in the hybrid deposition process the source of the carbon is dissociated hydrocarbon vapour in plasma. The aim of this paper is to study the extent of similarities or differences between this hybrid process and the conventional reactive magnetron sputtering. We have chosen the sputtering of titanium target in acetylene containing atmosphere as a representative of the hybrid processes. We focused on experimental measurements of the hybrid PVD–PECVD process behaviour, the time necessary for the process to achieve steady-state conditions and basic modelling of the process. (en)
Title	Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene (en)
skos:prefLabel	Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene (en)
skos:notation	RIV/00216224:14310/11:00049862!RIV12-GA0-14310___
http://linked.open...avai/predkladatel	Přírodovědecká fakulta
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(ED2.1.00/03.0086), P(GD104/09/H080), P(GP202/08/P038), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	July
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Souček, Pavel Schmidtová, Tereza Vašina, Petr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	233071
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/11:00049862
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Hybrid PVD–PECVD process; Reactive magnetron sputtering; Hysteresis; Modelling (en)
http://linked.open.../riv/klicoveSlovo	Hybrid PVD–PECVD process Modelling Reactive magnetron sputtering Hysteresis
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[645803369514]
http://linked.open...i/riv/nazevZdroje	Surface & Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Plasmachemical processes and their technological applications Regional R&D center for low-cost plasma and nanotechnology surface modifications Study of hybrid deposition process and its application for thin film deposition
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	205
http://linked.open...iv/tvurceVysledku	Schäfer, Jan Vašina, Petr Schmidtová, Tereza Souček, Pavel
http://linked.open...n/vavai/riv/zamer	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	0257-8972
number of pages	4 (xsd:int)
http://localhost/t...ganizacniJednotka	14310
is http://linked.open...avai/riv/vysledek of	Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene Study of hybrid PVD–PECVD process of Ti sputtering in argon and acetylene

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 58 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software