About: Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The reactive magnetron sputtering deposition process controlled by the flow of the reactive gas exhibits processing stability problems. Since the optimal experimental conditions lie very close to the abrupt transition from the metallic to the compound mode, the range at which the films with the right stoichiometry are deposited at high deposition rates is strongly limited and permanent process monitoring is necessary. A sensitive method for the process monitoring is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages during the radio-frequency sputtering deposition process. The voltage waveform recorded by the uncompensated probe placed in the vicinity of the plasma contains much higher relative proportion of higher harmonics than the waveform measured on the cathode. Some of the harmonics are extremely sensitive markers of the transition between the two regimes of interest. The reactive magnetron sputtering deposition process controlled by the flow of the reactive gas exhibits processing stability problems. Since the optimal experimental conditions lie very close to the abrupt transition from the metallic to the compound mode, the range at which the films with the right stoichiometry are deposited at high deposition rates is strongly limited and permanent process monitoring is necessary. A sensitive method for the process monitoring is proposed which is based on the measurement of amplitudes of fundamental or higher harmonic frequencies of discharge voltages during the radio-frequency sputtering deposition process. The voltage waveform recorded by the uncompensated probe placed in the vicinity of the plasma contains much higher relative proportion of higher harmonics than the waveform measured on the cathode. Some of the harmonics are extremely sensitive markers of the transition between the two regimes of interest. (en)
Title	Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process (en)
skos:prefLabel	Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process (en)
skos:notation	RIV/00216224:14310/09:00029226!RIV10-MSM-14310___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GP202/08/P038), Z(MSM0021622411)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Vašina, Petr Dvořák, Pavel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	316859
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/09:00029226
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	higher harmonics; plasma; discharge; reactive sputtering; magnetron (en)
http://linked.open.../riv/klicoveSlovo	higher harmonics reactive sputtering discharge plasma magnetron
http://linked.open...odStatuVydavatele	FR - Francouzská republika
http://linked.open...ontrolniKodProRIV	[F84862E86DE9]
http://linked.open...i/riv/nazevZdroje	Europhysics Letters
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...vavai/riv/projekt	Study of hybrid deposition process and its application for thin film deposition
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	85
http://linked.open...iv/tvurceVysledku	Dvořák, Pavel Vašina, Petr
http://linked.open...ain/vavai/riv/wos	000263692500019
http://linked.open...n/vavai/riv/zamer	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
issn	0295-5075
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	14310
is http://linked.open...avai/riv/vysledek of	Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process Harmonic analysis of discharge voltages as a tool to control the RF sputtering deposition process

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