About: Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague

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About: Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Projekt, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	http://linked.opendata.cz/ontology/domain/vavai/Projekt
rdfs:seeAlso	http://www.isvav.cz/projectDetail.do?rowId=VS96084
Description	The goal of the project is to create joint laboratories which will permit young scientific staff of Fac. of Sciences, MU, Fac. of Pedagogy, MU, Military Academy and Institute of Plasma Physics of AS to participate in the research (collaboration since 199) supported by three grants of the Grant Agency of Czech Republic.The research will be focused on studies of kinetics of plasmachemicalreactions and processes, mainly those involved during deposition of thin films (layers of hard and superhard materials,optically transparent oxinitride and oxicarbide layers, ceramic and polymeric layers based on organometals). The inherent part of the research will be the determination of electrical, mechanical and optical properties of these materials. New means of ignition of very poor mixtures in combustion engines using high-pressure gliding discharge will be developed. Research and development of new plasmachemical devices and technologies, capable of removal of highly toxic wastes, produced by the Army. (en) Vytvoření společných laboratoří umožňujících mladým vědeckým pracovníkům PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze podílet se společně na výzkumu, který se opírá o tři nově udělené granty GA ČR řešené společně v r. 1996-1998. Výzkumná činnost bude zaměřena na studium kinetiky plazmochemických procesů, nanášení tenkých vrstev tvrdých a supertvrdých materiálů, plazmochemickou cestou a na rozklad toxických látek produkovaných armádou ČR
Title	Common laboratories for applied plasma physics and plasma chemistry in PřF and PedF MU, VA Brno and ÚFP AV ČR in Prague (en) Společné laboratoře pro aplikovanou fyziku plazmatu a plazmovou chemii na PřF a PedF MU, VA v Brně a ÚFP AV ČR v Praze
skos:notation	VS96084
http://linked.open...avai/cep/aktivita	Strengthening of research at the universities
http://linked.open...kovaStatniPodpora	http://linked.opendata.cz/resource/domain/vavai/projekt/VS96084/celkovaStatniPodpora
http://linked.open...ep/celkoveNaklady	http://linked.opendata.cz/resource/domain/vavai/projekt/VS96084/celkoveNaklady
http://linked.open...ep/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open.../cep/fazeProjektu	597587
http://linked.open...ai/cep/hlavniObor	BL - Fyzika plasmatu a výboje v plynech
http://linked.open...hodnoceniProjektu	U - Uspěl podle zadání, tj. byly splněny cíle a jeho předpokládané výsledky uvedené ve smlouvě / rozhodnutí o poskytnutí podpory
http://linked.open.../cep/klicovaSlova	joint laboratory, young scientist, plasmachemistry, chemical kinetics, hard materials, PECVD, protec (en)
http://linked.open...ep/partnetrHlavni	Přírodovědecká fakulta
http://linked.open...inujicichPrijemcu	0 (xsd:int)
http://linked.open...cep/pocetPrijemcu	1 (xsd:int)
http://linked.open...ocetSpoluPrijemcu	0 (xsd:int)
http://linked.open.../pocetVysledkuRIV	60 (xsd:int)
http://linked.open...enychVysledkuVRIV	60 (xsd:int)
http://linked.open...iciPoslednihoRoku	2001
http://linked.open...atUdajeProjZameru	2001
http://linked.open...usZobrazovaneFaze	DUU
http://linked.open...ai/cep/typPojektu	P - Projekt výzkumu a vývoje financovaný ze státního rozpočtu
http://linked.open.../cep/vedlejsiObor	BM - Fyzika pevných látek a magnetismus JT - Pohon, motory a paliva
http://linked.open...jektu+dodavatelem	Výzkum v nově vzniklé laboratoři byl zaměřen zejména na studium kinetiky plazmochemických reakcí a procesů depozice tenkých vrstev tvrdých materiálů (nanokompozitní CNx/SiOy, vrstvy diamantového typu ). (cs)
http://linked.open...tniCyklusProjektu	ZBBBKU
http://linked.open.../cep/klicoveSlovo	PECVD chemical kinetics hard materials plasmachemistry young scientist joint laboratory
is http://linked.open...vavai/riv/projekt of	Ellipsometry of thin films Comparison of AFM and optical methods at measuring nanometric surface roughness DC AC and HF Plasma Pencil - New Possibilities for Plasma Surface and Liquid Treatment at Atmospheric Pressure Dependence of electron concetration in nitrogen afterglow on impurities Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry Comparison of optical and non-optical methods for measuring surface roughness Complete Optical Characterization of the SiO2/Si System by Spectroscopic Ellipsometry Spectroscopic Reflectometry and Atomic Force Microscopy Comparison of optical and non-optical methods for measuring surface roughness Plazmochemicka depozice oteruvzdornych tenkych vrstev na plastickych materialech PECVD of protection coatings containing carbon Atomic force microscopy measurements of surface roughness quantities important in optics of surfaces and thin films Characterization of CNx/SiOy Films Prepared by the Inductively Coupled RF Discharge Influence of admixtures on production rate of atomic nitrogen HF-Plasma Pencil in Liquids Influence of Discharge Parameters on Composition of Films Deposited by PECVD from Hexamethyldisiloxane/Oxygen Mixtures Matrix formalism for imperfect thin films Reduction of ATP precursors in capacvitive RF discharge plasma reactor Possibilities of Effective Fullerenes and Nanotubes Production by RF Discharges Reduction of APT Precursors in Experimental RF Discharge Plasma Reactor Optical diagnostics of inductively coupled RF discharge Optical Characterization of Diamond-like Carbon Films Optical characterization of nonabsorbing and weakly absorbing thin films with the wavelengths related to extrema in spectral reflectances RF discharge burning at atmospheric pressure and its interaction with water liquid Treatment of trimethylborate in unipolar plasma torch Study of CS2 Decomposition in Low-frequency Gliding Discharge Temperature Measurements and Energy Balance of Polycarbonate Samples during Plasma Treatment Surface Modification of Polymers by Low Pressure Plasma and Its Characterization Treatise on Heating of Objects Immersed in Plasma Analysis of inhomogeneous thin films of ZrO2 by the combined optical method and atomic force microscopy Additional microwave diagnostics of afterglow with ESR spectrometer Plasma modification of polycarbonates Study of hydrocarbons decomposition in microwave discharge and mass spectrometry of radiofrequency discharges in liquids XPS and Ellipsometric Study of DLC/Silicon Interface Parameterisation of the model of dispersion dependences of solid state optical constants Capacitive RF-discharge reactor for carbon-free iron preparation HF plasma pencil- new source for plasma surface processing Relationship Between AFM and Optical Measurements at Analyzing Surface Roughness Analysis of Slightly Rough Thin Films by Optical Methods and AFM Analysis of thin films by optical multi-sample methods A New Type of Ignition of Fuel Mixtures in Spark Ignition Engines by High Pressure Gliding Discharge Additional microwave diagnostics of afterglow with ESR spectrometer Deposition of nanocomposite CNx/SiO films in inductively coupled r.f. discharge Ellipsometry of Thin Film Systems Low Pressure Plasma treatment of polycarbonate Optical characterization of thin films with randomly rough boundaries using the photovoltage method Optical characterization of inhomogeneous thin films of ZrO2 by spectroscopic ellipsometry and spectroscopic reflectometry Optical diagnostics of inductively coupled RF discharge during deposition of nanocomposite CNx/SiOy films Plasmachemical Deposition of Thin Films Plasma Pencil - New Small Scale Source for Atmospheric Surface Modification Plasmachemical regeneration of ancient artefacts Plasma enhanced chemical vapor deposition of silicon incorporated diamond-like carbon films Plasma Surface Treatment of Textile Fibres for Improvement of Car Tires Spectroscopic Study of Pulsed Microwave Discharge Spectroscopic study of high power pulsed microwave discharge in nitrogen New methods applying plasma in liquid environment for the treatment and conservation of ancient artefacts Optical diagnostics of rf discharge burning at atmospheric pressure and interacting with water solution Application of plasma-liquid system to conservation treatment of ancient artifacts Determination of rate constant of N+HMDSZ gas phase chemical reaction by means of EPR Determination of Thicknesses and Spectral Dependences of Refractive Indices of Non-Absorbing and Weakly Absorbing Thin Films Using the Wavelengths Related to Extrema in Spectral Reflectances Modification of Plasma Deposited DLC Films by Hexamethyldisiloxane Addition
is http://linked.open...vavai/cep/projekt of	http://linked.opendata.cz/resource/domain/vavai/cep/ucast/VS96084/1996/ico%3A00216224 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/VS96084/1997/ico%3A00216224 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/VS96084/1998/ico%3A00216224 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/VS96084/1999/orjk%3A14310 http://linked.opendata.cz/resource/domain/vavai/cep/ucast/VS96084/2000/orjk%3A14310

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