About: High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target

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About: High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The paper reports on a reactive deposition of transparent SiO2 films with a low amount (<= 3 at.%) of Zr prepared from the molten target using the AC pulsed dual magnetron It is shown that the deposition rate a(D) of the transparent oxide film strongly increases at the critical target power density (W-t)(cr) when the solid target starts to melt and the magnetron operates with a molten target. In this case the evaporation of target material plays a dominant role in the reactive deposition of thin films This process is called the ionized magnetron evaporation Oxide films reactively deposited from the molten target are well transparent and highly elastic The maximum deposition rate of the transparent oxide film achieved in our experiments is 814 nm/min. The paper reports on a reactive deposition of transparent SiO2 films with a low amount (<= 3 at.%) of Zr prepared from the molten target using the AC pulsed dual magnetron It is shown that the deposition rate a(D) of the transparent oxide film strongly increases at the critical target power density (W-t)(cr) when the solid target starts to melt and the magnetron operates with a molten target. In this case the evaporation of target material plays a dominant role in the reactive deposition of thin films This process is called the ionized magnetron evaporation Oxide films reactively deposited from the molten target are well transparent and highly elastic The maximum deposition rate of the transparent oxide film achieved in our experiments is 814 nm/min. (en)
Title	High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target (en)
skos:prefLabel	High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target High-rate reactive deposition of transparent SiO2 films containing low amount of Zr from molten magnetron target (en)
skos:notation	RIV/68378271:_____/10:00437497!RIV15-AV0-68378271
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(OC10045), Z(AV0Z10100520), Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika	2
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Musil, Jindřich
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	261596
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/10:00437497
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	sputtering; evaporation; reactive deposition; target power density (en)
http://linked.open.../riv/klicoveSlovo	sputtering reactive deposition target power density evaporation
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[C8970F9AC35C]
http://linked.open...i/riv/nazevZdroje	Thin Solid Films
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	3 (xsd:int)
http://linked.open...vavai/riv/projekt	Novel plasma sources for film deposition and surface modification
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	519
http://linked.open...iv/tvurceVysledku	Musil, Jindřich Baroch, P. Satava, V.
http://linked.open...ain/vavai/riv/wos	000284499500039
http://linked.open...n/vavai/riv/zamer	Specific effects in condensed systems with reduced dimension and broken symmetry Procesy ve výbojovém plazmatu a nové tenkovrstvé materiály s unikátními vlastnostmi
issn	0040-6090
number of pages	3 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.tsf.2010.09.009

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