About: Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films

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About: Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	RF and DC plasma jet sputtering systems were investigated as sources for deposition of ZnO thin films. Deposited zone films have a strong orientation of hexagonal crystallites with the 'c' axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150 °C during the deposition. Langmuir probe measurement performed at the substrate revealed two groups of electrons with different temperatures in the DC plasma jet. A single group of electrons was found in the RF plasma jet system. Electron concentration in the RF jet was found to be about neRF ? 5 ? 109 1010 cm-3 with temperature TeRF ? 2.53.5 eV. In the DC plasma jet, concentration of cold electrons was usually nec ? 109 cm-3 with temperature Tec ? 0.5 eV and concentration of hot electrons was neh ? 108 cm-3 with temperature Teh ? 23.5 eV. Photographs also confirmed that the plasma density is higher in the position of the substrate in the RF jet than in the DC jet. RF and DC plasma jet sputtering systems were investigated as sources for deposition of ZnO thin films. Deposited zone films have a strong orientation of hexagonal crystallites with the 'c' axis perpendicular to the substrate surface. Temperature of the substrate did not exceed 150 °C during the deposition. Langmuir probe measurement performed at the substrate revealed two groups of electrons with different temperatures in the DC plasma jet. A single group of electrons was found in the RF plasma jet system. Electron concentration in the RF jet was found to be about neRF ? 5 ? 109 1010 cm-3 with temperature TeRF ? 2.53.5 eV. In the DC plasma jet, concentration of cold electrons was usually nec ? 109 cm-3 with temperature Tec ? 0.5 eV and concentration of hot electrons was neh ? 108 cm-3 with temperature Teh ? 23.5 eV. Photographs also confirmed that the plasma density is higher in the position of the substrate in the RF jet than in the DC jet. (en)
Title	Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films (en)
skos:prefLabel	Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films Investigation of RF and DC plasma jet system during deposition of highly oriented ZnO thin films (en)
skos:notation	RIV/68407700:21340/03:04092460!RIV/2004/MSM/213404/N
http://linked.open.../vavai/riv/strany	627 ; 631
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/00/1592), P(GP202/02/P021), P(LN00A015), P(ME 441), Z(AV0Z1010914), Z(MSM 113200002), Z(MSM 210000022)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2004
http://linked.open...aciTvurceVysledku	Ptáček, Pavel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta jaderná a fyzikálně inženýrská
http://linked.open...dnocenehoVysledku	611172
http://linked.open...ai/riv/idVysledku	RIV/68407700:21340/03:04092460
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Plasma jet; ZnO thin films; Langmuir probe; Hollow cathode discharge (en)
http://linked.open.../riv/klicoveSlovo	Langmuir probe Plasma jet ZnO thin films Hollow cathode discharge
http://linked.open...odStatuVydavatele	NL - Nizozemsko
http://linked.open...ontrolniKodProRIV	[CEF8804BF8B1]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Research center for optics Investigation of physical parameters and optimisation of novel system for plasma surface treatment Investigation of physical properties and applications of the low pressure plasma-chemical reactor with the system plasma jet channels for thin films deposition http://linked.opendata.cz/resource/domain/vavai/projekt/ME%20441
http://linked.open...UplatneniVysledku	2003
http://linked.open...v/svazekPeriodika	174
http://linked.open...iv/tvurceVysledku	Jastrabík, L. Ptáček, Pavel Hubička, Z. Adámek, P. Čada, M. Šícha, M. Šíchová, H.
http://linked.open...n/vavai/riv/zamer	Experimentální a teoretický výzkum kondenzovaných systémů s význačnými fyzikálními vlastnostmi http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20113200002 http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20210000022
issn	0257-8972
number of pages	5 (xsd:int)
http://localhost/t...ganizacniJednotka	21340

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