About: Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The pulsed DC magnetron and hollow-cathode plasma jet sources have been studied from the point of view of total energy flux density at a ''floating'' substrate. Both plasma sources were operated under identical experimental conditions and differences between both systems were investigated. The aim of this work is focused on the characterization of total power density at electrically isolated substrate for various duty cycles and for different pulsing frequencies. A calorimeter probe with incorporated thermocouple junction was used for measurement of the total power density on the substrate. The main results from the calorimeter probe show clearly that total power density at the substrate is much higher for the planar magnetron operating at low duty cycle and high pulsing frequency than for the plasma jet. The total power density measured in the planar magnetron depends more strongly on the duty cycle and the pulsing frequency than measured in the plasma jet. The pulsed DC magnetron and hollow-cathode plasma jet sources have been studied from the point of view of total energy flux density at a ''floating'' substrate. Both plasma sources were operated under identical experimental conditions and differences between both systems were investigated. The aim of this work is focused on the characterization of total power density at electrically isolated substrate for various duty cycles and for different pulsing frequencies. A calorimeter probe with incorporated thermocouple junction was used for measurement of the total power density on the substrate. The main results from the calorimeter probe show clearly that total power density at the substrate is much higher for the planar magnetron operating at low duty cycle and high pulsing frequency than for the plasma jet. The total power density measured in the planar magnetron depends more strongly on the duty cycle and the pulsing frequency than measured in the plasma jet. (en)
Title	Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems (en)
skos:prefLabel	Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems (en)
skos:notation	RIV/68407700:21340/09:00164553!RIV13-MSM-21340___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(1M06002), P(KAN301370701), P(KJB100100707), P(KJB100100805), Z(AV0Z10100522), Z(MSM6840770021)
http://linked.open...iv/cisloPeriodika	6
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Kment, Štěpán
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta jaderná a fyzikálně inženýrská
http://linked.open...dnocenehoVysledku	307654
http://linked.open...ai/riv/idVysledku	RIV/68407700:21340/09:00164553
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Calorimeter probe; Floating substráte; Magnetron; Plasma jet; Pulsed discharge (en)
http://linked.open.../riv/klicoveSlovo	Plasma jet Magnetron Calorimeter probe Floating substráte Pulsed discharge
http://linked.open...odStatuVydavatele	DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV	[5823BC198FFC]
http://linked.open...i/riv/nazevZdroje	Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Optical structures, detection systems and relevant technologies for low photon number applications Nanostructured Macroscopic Systems - Technology and Characterisation A diagnostics of pulsed plasma generated in systems with plasma jets used for technological applications of thin film deposition. Low-temperature plasmatic deposition of polycrystalline and nanocrystalline oxide thin films by systems with hollow cathodes
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	-
http://linked.open...iv/tvurceVysledku	Kment, Štěpán Hubička, Z. Čada, M. Virostko, P.
http://linked.open...ain/vavai/riv/wos	000272302900050
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology Characterization of materials
issn	1612-8850
number of pages	6 (xsd:int)
http://bibframe.org/vocab/doi	10.1002/ppap.200930611
http://localhost/t...ganizacniJednotka	21340
is http://linked.open...avai/riv/vysledek of	Comparative Study of Total Power Density at a Substrate in Pulsed DC Magnetron and Hollow-Cathode Plasma Jet Sputtering Systems

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