About: Physical Properties of Homogeneous TiO2 Films Prepared by High Power Impulse Magnetron Sputtering as a Function of Crystallographic Phase and Nanostructure

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Optical, photo-electrochemical, crystallographic and morphological properties of TiO2 thin films prepared by high power impulse magnetron sputtering at low substrate temperatures (<65 °C) without post-deposition thermal annealing are studied. The different crystallographic phases were determined with grazing incidence x-ray diffractometry. The surface morphology and size of TiO2 grains/clusters were imaged with atomic force microscopy. Basic plasma parameters were determined by means of the time-resolved Langmuir probe technique. The power density influx on the substrate was estimated from calorimetric probe measurement. The data from calorimetric probe measurements and time-resolved Langmuir probe served as input parameters for the calculation of influx contributions of particular species. Optical, photo-electrochemical, crystallographic and morphological properties of TiO2 thin films prepared by high power impulse magnetron sputtering at low substrate temperatures (<65 °C) without post-deposition thermal annealing are studied. The different crystallographic phases were determined with grazing incidence x-ray diffractometry. The surface morphology and size of TiO2 grains/clusters were imaged with atomic force microscopy. Basic plasma parameters were determined by means of the time-resolved Langmuir probe technique. The power density influx on the substrate was estimated from calorimetric probe measurement. The data from calorimetric probe measurements and time-resolved Langmuir probe served as input parameters for the calculation of influx contributions of particular species. (en)
Title	Physical Properties of Homogeneous TiO2 Films Prepared by High Power Impulse Magnetron Sputtering as a Function of Crystallographic Phase and Nanostructure Physical Properties of Homogeneous TiO2 Films Prepared by High Power Impulse Magnetron Sputtering as a Function of Crystallographic Phase and Nanostructure (en)
skos:prefLabel	Physical Properties of Homogeneous TiO2 Films Prepared by High Power Impulse Magnetron Sputtering as a Function of Crystallographic Phase and Nanostructure Physical Properties of Homogeneous TiO2 Films Prepared by High Power Impulse Magnetron Sputtering as a Function of Crystallographic Phase and Nanostructure (en)
skos:notation	RIV/68407700:21340/09:00164106!RIV13-MSM-21340___
http://linked.open...avai/riv/aktivita	P V Z
http://linked.open...avai/riv/aktivity	P(KAN301370701), P(KAN400720701), P(KJB100100805), V, Z(AV0Z10100522), Z(MSM0021620834), Z(MSM6840770021)
http://linked.open...iv/cisloPeriodika	10
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Kment, Štěpán
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	České vysoké učení technické v Praze / Fakulta jaderná a fyzikálně inženýrská
http://linked.open...dnocenehoVysledku	333417
http://linked.open...ai/riv/idVysledku	RIV/68407700:21340/09:00164106
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Elektron-energy distribution; Thin films; Spectroscopic ellipsometry; Titanium dioxide; Discharge; Layers; Temperatures; Degradation; Emission; Surface (en)
http://linked.open.../riv/klicoveSlovo	Discharge Layers Surface Thin films Emission Spectroscopic ellipsometry Elektron-energy distribution Temperatures Titanium dioxide Degradation
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[84F7226B3238]
http://linked.open...i/riv/nazevZdroje	Journal of Physics D: Applied Physics
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	11 (xsd:int)
http://linked.open...vavai/riv/projekt	Nanostructured Macroscopic Systems - Technology and Characterisation Hierarchic nanosystems for microelektronics A diagnostics of pulsed plasma generated in systems with plasma jets used for technological applications of thin film deposition.
http://linked.open...UplatneniVysledku	2009
http://linked.open...v/svazekPeriodika	42
http://linked.open...iv/tvurceVysledku	Kment, Štěpán Hippler, R. Straňák, V. Tichý, M. Wulff, H. Block, S. Hubička, Z. Čada, M. Quaas, M. Bogdanowitz, R. Helm, Ch.
http://linked.open...ain/vavai/riv/wos	000265677400036
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology Condensed Matter Physics – New Materials and Technologies Characterization of materials
issn	0022-3727
number of pages	12 (xsd:int)
http://bibframe.org/vocab/doi	10.1088/0022-3727/42/10/105204
http://localhost/t...ganizacniJednotka	21340
is http://linked.open...avai/riv/vysledek of	Physical Properties of Homogeneous TiO2 Films Prepared by High Power Impulse Magnetron Sputtering as a Function of Crystallographic Phase and Nanostructure

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