About: Multi-SWD plasma jet system for PECVD deposition of thin films

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Multiplasma jet surface-wave discharge launched by the surfatron is a promising PECVD tool for scalable deposition of various semiconductor materials. The timeresolved Langmuir probe study revealed that the plasma plume is inhomogeneous toward the substrate. In the measured interval, the electron energy and the plasma density increased with distance from the nozzle outlet. These findings allowed us to optimize the substrate position during the deposition process. Multiplasma jet surface-wave discharge launched by the surfatron is a promising PECVD tool for scalable deposition of various semiconductor materials. The timeresolved Langmuir probe study revealed that the plasma plume is inhomogeneous toward the substrate. In the measured interval, the electron energy and the plasma density increased with distance from the nozzle outlet. These findings allowed us to optimize the substrate position during the deposition process. (en)
Title	Multi-SWD plasma jet system for PECVD deposition of thin films Multi-SWD plasma jet system for PECVD deposition of thin films (en)
skos:prefLabel	Multi-SWD plasma jet system for PECVD deposition of thin films Multi-SWD plasma jet system for PECVD deposition of thin films (en)
skos:notation	RIV/68378271:_____/14:00438735!RIV15-TA0-68378271
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(LH12045), P(TA01011740)
http://linked.open...iv/cisloPeriodika	10
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Čada, Martin Hubička, Zdeněk Olejníček, Jiří Kment, Štěpán Šmíd, Jiří
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	31131
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/14:00438735
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	nuclear and plasma sciences; plasma applications; plasma devices; plasmas (en)
http://linked.open.../riv/klicoveSlovo	nuclear and plasma sciences plasma applications plasmas plasma devices
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[96544EF82174]
http://linked.open...i/riv/nazevZdroje	IEEE Transactions on Plasma Science
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Fabrication and analysis of the properties of Cu(In,X)Se2 thin-film solar cells prepared from plasma-sputtered and spray-deposited precursors Hybrid high-density low-temperature microwave plasma sources in matrix configuration suitable for growth of advanced materials and their (nano) composites on 2D and 3D substrates
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	42
http://linked.open...iv/tvurceVysledku	Kment, Štěpán Olejníček, Jiří Šmíd, Jiří Hubička, Zdeněk Čada, Martin
http://linked.open...ain/vavai/riv/wos	000344548300089
issn	0093-3813
number of pages	2 (xsd:int)
http://bibframe.org/vocab/doi	10.1109/TPS.2014.2314214

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