About: Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system

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About: Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Growth of diamond coatings with tunable morphology and concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were studied. The dependence of plasma parameters on gas composition was studied by Langmuir probe measurement. Grown diamond coatings and carbon nanotubes were characterized by scanning electron microscopy and Raman spectroscopy and correlated with process parameters. Well-defined nanocrystalline, polycrystalline, and porous diamond films were prepared. Concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were shown. Growth of diamond coatings with tunable morphology and concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were studied. The dependence of plasma parameters on gas composition was studied by Langmuir probe measurement. Grown diamond coatings and carbon nanotubes were characterized by scanning electron microscopy and Raman spectroscopy and correlated with process parameters. Well-defined nanocrystalline, polycrystalline, and porous diamond films were prepared. Concurrent substrate catalyst pretreatment and further growth of carbon nanotubes were shown. (en)
Title	Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system (en)
skos:prefLabel	Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system Growth of carbon allotropes and plasma characterization in linear antenna microwave plasma CVD system (en)
skos:notation	RIV/68378271:_____/14:00432261!RIV15-GA0-68378271
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(GAP205/12/0908), P(TA01011740)
http://linked.open...iv/cisloPeriodika	5
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Čada, Martin Kromka, Alexander Potocký, Štěpán Davydova, Marina Babchenko, Oleg Ižák, Tibor
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	18653
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/14:00432261
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	antenna linear; CVD system; plasma (en)
http://linked.open.../riv/klicoveSlovo	CVD system antenna linear plasma
http://linked.open...odStatuVydavatele	JP - Japonsko
http://linked.open...ontrolniKodProRIV	[B76820139EF9]
http://linked.open...i/riv/nazevZdroje	Japanese Journal of Applied Physics
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	6 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced experimental research of large area microwave plasma system for deposition of nanocrystalline diamond films Hybrid high-density low-temperature microwave plasma sources in matrix configuration suitable for growth of advanced materials and their (nano) composites on 2D and 3D substrates
http://linked.open...UplatneniVysledku	2014
http://linked.open...v/svazekPeriodika	53
http://linked.open...iv/tvurceVysledku	Babchenko, Oleg Kromka, Alexander Ižák, Tibor Čada, Martin Potocký, Štěpán Davydova, Marina
http://linked.open...ain/vavai/riv/wos	000338316200114
issn	0021-4922
number of pages	3 (xsd:int)
http://bibframe.org/vocab/doi	10.7567/JJAP.53.05FP04

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