About: Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

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Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
rdfs:seeAlso	http://www.sciencedirect.com/science/article/pii/S0257897213004829
Description	A hybrid high-power impulse magnetron sputtering (HiPIMS) + mid-frequency (MF) magnetron sputtering system was used for the deposition of crystalline TiO2 thin films at a low substrate temperature. Ion velocity distribution functions were measured in a pulsed magnetron discharge at substrate positions depending on the type of plasma excitation and on theworking gasmixtures. Several different pulsed discharge configurations were used: (i) HiPIMS, (ii) pulsed bipolar MF with frequency 350 kHz and (iii) both HiPIMS + MF connected in parallel to themagnetron cathode. Ti targets were sputtered in three different types of atmospheres: (i) inert pure Ar, (ii) a reactive mixture of Ar + O2 and (iii) a reactive mixture of Ar + O2 + N2 with a constant gas pressure p = 1 Pa. All IVDFs were measured using a time-resolved retarding field energy analyzer (RFEA) located in the substrate position. The thin film properties are discussed with respect to the measured plasma parameters. A hybrid high-power impulse magnetron sputtering (HiPIMS) + mid-frequency (MF) magnetron sputtering system was used for the deposition of crystalline TiO2 thin films at a low substrate temperature. Ion velocity distribution functions were measured in a pulsed magnetron discharge at substrate positions depending on the type of plasma excitation and on theworking gasmixtures. Several different pulsed discharge configurations were used: (i) HiPIMS, (ii) pulsed bipolar MF with frequency 350 kHz and (iii) both HiPIMS + MF connected in parallel to themagnetron cathode. Ti targets were sputtered in three different types of atmospheres: (i) inert pure Ar, (ii) a reactive mixture of Ar + O2 and (iii) a reactive mixture of Ar + O2 + N2 with a constant gas pressure p = 1 Pa. All IVDFs were measured using a time-resolved retarding field energy analyzer (RFEA) located in the substrate position. The thin film properties are discussed with respect to the measured plasma parameters. (en)
Title	Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films (en)
skos:prefLabel	Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films (en)
skos:notation	RIV/68378271:_____/13:00422122!RIV15-GA0-68378271
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(GAP108/12/1941), P(GAP108/12/2104), P(LD12002), P(LH12043), P(LH12045)
http://linked.open...iv/cisloPeriodika	OCT
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Gregora, Ivan Čada, Martin Kšírová, Petra Hubička, Zdeněk Adámek, Petr Olejníček, Jiří Kment, Štěpán
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	81112
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/13:00422122
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	HiPIMS; mid-frequency; ion velocity distribution function; TiO2; rutile (en)
http://linked.open.../riv/klicoveSlovo	TiO2 HiPIMS rutile ion velocity distribution function mid-frequency
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[B8A96AD0D0F1]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	7 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Investigation of hybrid HiPIMS systems for deposition of nanostructured thin films A Study of thin films systems based on Iron Pyrite (FeS2) for Photonic Applications. Advanced preparation methods and experimental research of doped perovskite thin-film systems for high density energy storages Advanced semiconductor materials for photoelectrochemical water splitting Fabrication and analysis of the properties of Cu(In,X)Se2 thin-film solar cells prepared from plasma-sputtered and spray-deposited precursors
http://linked.open...UplatneniVysledku	2013
http://linked.open...v/svazekPeriodika	232
http://linked.open...iv/tvurceVysledku	Adámek, Petr Kment, Štěpán Olejníček, Jiří Gregora, Ivan Hubička, Zdeněk Kšírová, Petra Čada, Martin
http://linked.open...ain/vavai/riv/wos	000327691300050
issn	0257-8972
number of pages	8 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2013.05.038

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