About: Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system

Facets (new session)
Description
Metadata
Settings
- owl:sameAs
- Inference Rule:

About: Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system Goto Sponge NotDistinct Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

Attributes	Values
rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1–25 kHz) and the duty cycles (20–90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100–800 mA) and the pressure in the condensation tube (25–90 Pa) is also investigated. For all preparation conditions, the cluster mass shows a lognormal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 105amu, or cluster diameter 8–10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critical buffer gas temperature Tg-cr which limits cluster growth. Size-controlled Cu clusters are formed in a system which combines pulsed magnetron sputtering and gas condensation at room temperature. The discharge repetition frequency (0.1–25 kHz) and the duty cycles (20–90%) of the magnetron sputtering are varied systematically, the influence of discharge current (100–800 mA) and the pressure in the condensation tube (25–90 Pa) is also investigated. For all preparation conditions, the cluster mass shows a lognormal distribution. A non-monotonic frequency dependence with a maximum at 1 kHz and 20% of duty cycle is observed (about 105amu, or cluster diameter 8–10 nm). By adjusting discharge frequency and duty cycle, the cluster mass can be decreased by one order of magnitude. We suggest that this effect is caused by energy dissipated into the aggregation tube; and find a critical buffer gas temperature Tg-cr which limits cluster growth. (en)
Title	Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system (en)
skos:prefLabel	Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system (en)
skos:notation	RIV/68378271:_____/11:00367262!RIV12-AV0-68378271
http://linked.open...avai/predkladatel	Fyzikální ústav AV ČR, v.v.i.
http://linked.open...avai/riv/aktivita	P S Z
http://linked.open...avai/riv/aktivity	P(1M06002), P(GAP205/11/0386), P(KAN301370701), P(KJB100100805), S, Z(AV0Z10100522), Z(MSM0021620834)
http://linked.open...iv/cisloPeriodika	8-9
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Hubička, Zdeněk Jastrabík, Lubomír
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Fyzikální ústav AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	229620
http://linked.open...ai/riv/idVysledku	RIV/68378271:_____/11:00367262
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	Cu cluster growth; pulsed magnetron sputtering; cluster mass- and size- distribution; AFM (en)
http://linked.open.../riv/klicoveSlovo	Cu cluster growth cluster mass- and size- distribution pulsed magnetron sputtering AFM
http://linked.open...odStatuVydavatele	CH - Švýcarská konfederace
http://linked.open...ontrolniKodProRIV	[877A505C1237]
http://linked.open...i/riv/nazevZdroje	Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor	BM
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Optical structures, detection systems and relevant technologies for low photon number applications Advanced experimental research of discharge plasma sources applied for deposition of nanostructured thin films Nanostructured Macroscopic Systems - Technology and Characterisation A diagnostics of pulsed plasma generated in systems with plasma jets used for technological applications of thin film deposition.
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	205
http://linked.open...iv/tvurceVysledku	Jastrabík, Lubomír Hubička, Zdeněk Drache, S. Hippler, R. Straňák, V. Tichý, M. Block, S. Helm, Ch. A.
http://linked.open...ain/vavai/riv/wos	000286905100009
http://linked.open...n/vavai/riv/zamer	Wave and Corpuscular Light Propagation, Optical Materials and Technology Condensed Matter Physics – New Materials and Technologies
issn	0257-8972
number of pages	8 (xsd:int)
http://bibframe.org/vocab/doi	10.1016/j.surfcoat.2010.10.030
is http://linked.open...avai/riv/vysledek of	Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system Size-controlled formation of Cu nanoclusters in pulsed magnetron sputtering system

Faceted Search & Find service v1.16.118 as of Jun 21 2024

Alternative Linked Data Documents: ODE Content Formats:

RDF

ODATA

Microdata

About

OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 47 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software