About: Plasmonic Structures In PMMA Resist

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Some metal material can exhibit special physical phenomenon which is called plasmon resonance. This effect can be used in optical applications where designed structures, using this effect, have special function as optical filters, polarizers, holograms etc. This papers deals with preparation of plasmonic structures in poly(methyl methacrylate) (PMMA) resist which is the most common material used for e-beam processing. Designed structures were prepared by e-beam writer with Gaussian beam and accelerating voltage of 100 kV. These structures are usually prepared into negative tone resist hydrogen silsesquioxane (HSQ). We prepared these structures by unusual way into positive resist PMMA due to unavailability and cost of HSQ resist. By this way we are able to achieve high resolution of structures suitable for special optical application. Exposed structures were developed in isopropyl based developer. Final structures after development were coated by two metal layers (first one is Ag layer, second one is gold) by magnetron sputtering and vacuum evaporation. The quality of prepared plasmonic structures was examined by confocal laser scanning microscopy (CLSM) and scanning electron microscopy (SEM). Some metal material can exhibit special physical phenomenon which is called plasmon resonance. This effect can be used in optical applications where designed structures, using this effect, have special function as optical filters, polarizers, holograms etc. This papers deals with preparation of plasmonic structures in poly(methyl methacrylate) (PMMA) resist which is the most common material used for e-beam processing. Designed structures were prepared by e-beam writer with Gaussian beam and accelerating voltage of 100 kV. These structures are usually prepared into negative tone resist hydrogen silsesquioxane (HSQ). We prepared these structures by unusual way into positive resist PMMA due to unavailability and cost of HSQ resist. By this way we are able to achieve high resolution of structures suitable for special optical application. Exposed structures were developed in isopropyl based developer. Final structures after development were coated by two metal layers (first one is Ag layer, second one is gold) by magnetron sputtering and vacuum evaporation. The quality of prepared plasmonic structures was examined by confocal laser scanning microscopy (CLSM) and scanning electron microscopy (SEM). (en)
Title	Plasmonic Structures In PMMA Resist Plasmonic Structures In PMMA Resist (en)
skos:prefLabel	Plasmonic Structures In PMMA Resist Plasmonic Structures In PMMA Resist (en)
skos:notation	RIV/68081731:_____/14:00437827!RIV15-TA0-68081731
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(ED0017/01/01), P(LO1212), P(TE01020233)
http://linked.open...vai/riv/dodaniDat	2015
http://linked.open...aciTvurceVysledku	Horáček, Miroslav Kolařík, Vladimír Matějka, Milan Urbánek, Michal Krátký, Stanislav
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	36811
http://linked.open...ai/riv/idVysledku	RIV/68081731:_____/14:00437827
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	electron beam lithography; plasmonic structures; PMMA; metal coating (en)
http://linked.open.../riv/klicoveSlovo	metal coating plasmonic structures electron beam lithography PMMA
http://linked.open...ontrolniKodProRIV	[59706D3C8183]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Ostrava
http://linked.open...i/riv/nazevZdroje	NANOCON 2014. 6th International conference proceedings
http://linked.open...in/vavai/riv/obor	BA
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	6 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced Microscopy and Spectroscopy Platform for Research and Development in Nano and Microtechnologies - AMISPEC ALISI - Centre of advanced diagnostic methods and technologies APPLICATION LABORATORIES OF ADVANCED MICROTECHNOLOGIES AND NANOTECHNOLOGIES
http://linked.open...UplatneniVysledku	2014
http://linked.open...iv/tvurceVysledku	Horáček, Miroslav Matějka, Milan Urbánek, Michal Kolařík, Vladimír Krátký, Stanislav Šimík, M.
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2014-11-05 (xsd:date)
number of pages	5 (xsd:int)
http://purl.org/ne...btex#hasPublisher	TANGER
https://schema.org/isbn	978-80-87294-55-0

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