About: Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	A proximity effect simulation technique and developed resist profile simulation for variable-shaped e-beam lithography of three dimensional structures are presented. The e-beam lithography is a technology process which allows high resolution patterning. Most frequently it is used for microfabrication or nanofabrication of two dimensional relief structures such as resist photo masks, etching masks, diffraction gratings, micro and nano optics, photonics and more. However, in the case of the 3D structures patterning the precise thickness control of developed resist is required. With regard to subsequent proximity effect correction, the proximity effect simulation and developed resist profile simulation models are in the case of 3D structures fabrication critically important. We show the results from simulation of exposure and resist development process for the chosen polymer resist (PMMA), using the patterning and simulation e-beam lithography software. A proximity effect simulation technique and developed resist profile simulation for variable-shaped e-beam lithography of three dimensional structures are presented. The e-beam lithography is a technology process which allows high resolution patterning. Most frequently it is used for microfabrication or nanofabrication of two dimensional relief structures such as resist photo masks, etching masks, diffraction gratings, micro and nano optics, photonics and more. However, in the case of the 3D structures patterning the precise thickness control of developed resist is required. With regard to subsequent proximity effect correction, the proximity effect simulation and developed resist profile simulation models are in the case of 3D structures fabrication critically important. We show the results from simulation of exposure and resist development process for the chosen polymer resist (PMMA), using the patterning and simulation e-beam lithography software. (en)
Title	Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures (en)
skos:prefLabel	Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures (en)
skos:notation	RIV/68081731:_____/12:00390982!RIV13-AV0-68081731
http://linked.open...avai/predkladatel	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(ED0017/01/01), P(FR-TI1/576), P(TE01020233)
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Matějka, Milan Krátký, Stanislav
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	177012
http://linked.open...ai/riv/idVysledku	RIV/68081731:_____/12:00390982
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	3D resist structures; variable shape electron beam lithography; proximity effect simulation and correction; polymer resist; development process simulation (en)
http://linked.open.../riv/klicoveSlovo	3D resist structures development process simulation polymer resist proximity effect simulation and correction variable shape electron beam lithography
http://linked.open...ontrolniKodProRIV	[3FF84EFC6A31]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Ostrava
http://linked.open...i/riv/nazevZdroje	NANOCON 2012, 4th International Conference Proceedings
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	7 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced Microscopy and Spectroscopy Platform for Research and Development in Nano and Microtechnologies - AMISPEC Optimization of electron-beam production technology APPLICATION LABORATORIES OF ADVANCED MICROTECHNOLOGIES AND NANOTECHNOLOGIES
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Matějka, Milan Krátký, Stanislav Mikšík, P. Vašina, J. Horáček, M. Kolařík, V. Urbánek, M.
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2012-10-23 (xsd:date)
number of pages	4 (xsd:int)
http://purl.org/ne...btex#hasPublisher	TANGER Ltd
https://schema.org/isbn	978-80-87294-32-1
is http://linked.open...avai/riv/vysledek of	Variable-shape E-beam litography: Proximity effect simulation of 3D micro and nano sructures

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