About: Nano modification of the W(100)/ZrO electron emitter tip using reactive ion etching

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About: Nano modification of the W(100)/ZrO electron emitter tip using reactive ion etching Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The W(100)/ZrO electron emitter tip is typically prepared from a tungsten single-crystal shaft of a diameter of 125 μm using electrochemical anodic etching. In order to prepare an emitter for e-beam writer with a shaped beam it is desirable to etch the tip with a radius around 100 nm. Despite the anodic etching is precisely controlled using dedicated software, the desired final form shape of the emitter tip is not achieved in every case. The correcting anodic etching is not possible due to the technology principle of the etching itself. We present in this contribution the procedure that modifies/repairs the tungsten tip shape in a nanoscale region using a reactive ion etching (RIE) in CF4 + O2 gaseous mix in a barrel type reactor at the radio frequency of 13,56 MHz and the working pressure of 1000 Pa. The change of the geometry after the RIE process is checked using a high resolution scanning electron microscope. The influence of the tip modification of the activated thermal-field W(100)/ZrO electron emitter on its emission characteristics is also presented. The W(100)/ZrO electron emitter tip is typically prepared from a tungsten single-crystal shaft of a diameter of 125 μm using electrochemical anodic etching. In order to prepare an emitter for e-beam writer with a shaped beam it is desirable to etch the tip with a radius around 100 nm. Despite the anodic etching is precisely controlled using dedicated software, the desired final form shape of the emitter tip is not achieved in every case. The correcting anodic etching is not possible due to the technology principle of the etching itself. We present in this contribution the procedure that modifies/repairs the tungsten tip shape in a nanoscale region using a reactive ion etching (RIE) in CF4 + O2 gaseous mix in a barrel type reactor at the radio frequency of 13,56 MHz and the working pressure of 1000 Pa. The change of the geometry after the RIE process is checked using a high resolution scanning electron microscope. The influence of the tip modification of the activated thermal-field W(100)/ZrO electron emitter on its emission characteristics is also presented. (en)
Title	Nano modification of the W(100)/ZrO electron emitter tip using reactive ion etching Nano modification of the W(100)/ZrO electron emitter tip using reactive ion etching (en)
skos:prefLabel	Nano modification of the W(100)/ZrO electron emitter tip using reactive ion etching Nano modification of the W(100)/ZrO electron emitter tip using reactive ion etching (en)
skos:notation	RIV/68081731:_____/12:00390980!RIV13-AV0-68081731
http://linked.open...avai/predkladatel	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(ED0017/01/01), P(TE01020118)
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Horáček, Miroslav Kolařík, Vladimír Matějka, František Matějka, Milan Urbánek, Michal
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	152898
http://linked.open...ai/riv/idVysledku	RIV/68081731:_____/12:00390980
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	electron emitter; reactive ion etching; electron emission; thermal field; W(100)/ZrO (en)
http://linked.open.../riv/klicoveSlovo	reactive ion etching W(100)/ZrO electron emission electron emitter thermal field
http://linked.open...ontrolniKodProRIV	[1086D2071176]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Ostrava
http://linked.open...i/riv/nazevZdroje	NANOCON 2012, 4th International Conference Proceedings
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...vavai/riv/projekt	Electron microscopy APPLICATION LABORATORIES OF ADVANCED MICROTECHNOLOGIES AND NANOTECHNOLOGIES
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Horáček, Miroslav Matějka, Milan Urbánek, Michal Kolařík, Vladimír Matějka, František
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2012-10-23 (xsd:date)
number of pages	6 (xsd:int)
http://purl.org/ne...btex#hasPublisher	TANGER Ltd
https://schema.org/isbn	978-80-87294-32-1
is http://linked.open...avai/riv/vysledek of	Nano modification of the W(100)/ZrO electron emitter tip using reactive ion etching

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