About: Calibration specimens for microscopy

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Recent developments in nanotechnologies raised new issues in microscopy with nanometer and sub nanometer resolution. Together with the imaging techniques, new approaches in the metrology field are required both in the direct metrology issues and in the area of calibration of the imaging tools (microscopes). Scanning electron microscopy needs the calibration specimens for adjusting the size of the view field (correct magnification) and the shape of that field (correction of deflection field distortions). Calibration specimens have been prepared using different technologies; among them the e–beam patterning and the e–beam lithography have been proved to be appropriate and flexible tool for that task. In the past, we have reported several times our achievements in this field (e.g. [1]). Nevertheless, recent advances of the patterning tool (BS600), mainly the development of the technology zoomed exposure mode [2] and the installation of the magnetic field active cancellation system [3], pushed remarkably the technology necessary for further advances in this area. Within this contribution some theoretical, technology and practical aspects are discussed; achieved results are presented. Recent developments in nanotechnologies raised new issues in microscopy with nanometer and sub nanometer resolution. Together with the imaging techniques, new approaches in the metrology field are required both in the direct metrology issues and in the area of calibration of the imaging tools (microscopes). Scanning electron microscopy needs the calibration specimens for adjusting the size of the view field (correct magnification) and the shape of that field (correction of deflection field distortions). Calibration specimens have been prepared using different technologies; among them the e–beam patterning and the e–beam lithography have been proved to be appropriate and flexible tool for that task. In the past, we have reported several times our achievements in this field (e.g. [1]). Nevertheless, recent advances of the patterning tool (BS600), mainly the development of the technology zoomed exposure mode [2] and the installation of the magnetic field active cancellation system [3], pushed remarkably the technology necessary for further advances in this area. Within this contribution some theoretical, technology and practical aspects are discussed; achieved results are presented. (en)
Title	Calibration specimens for microscopy Calibration specimens for microscopy (en)
skos:prefLabel	Calibration specimens for microscopy Calibration specimens for microscopy (en)
skos:notation	RIV/68081731:_____/12:00390976!RIV13-AV0-68081731
http://linked.open...avai/predkladatel	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...avai/riv/aktivita	I P
http://linked.open...avai/riv/aktivity	I, P(ED0017/01/01), P(FR-TI1/576), P(TE01020233)
http://linked.open...vai/riv/dodaniDat	2013
http://linked.open...aciTvurceVysledku	Horáček, Miroslav Bok, Jan Kolařík, Vladimír Matějka, František Matějka, Milan Urbánek, Michal Král, Stanislav Krátký, Stanislav
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Ústav přístrojové techniky AV ČR, v. v. i.
http://linked.open...dnocenehoVysledku	125845
http://linked.open...ai/riv/idVysledku	RIV/68081731:_____/12:00390976
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	E-beam technology; calibration specimen; scanning electron microscopy (en)
http://linked.open.../riv/klicoveSlovo	E-beam technology calibration specimen scanning electron microscopy
http://linked.open...ontrolniKodProRIV	[583C141DC488]
http://linked.open...v/mistoKonaniAkce	Brno
http://linked.open...i/riv/mistoVydani	Ostrava
http://linked.open...i/riv/nazevZdroje	NANOCON 2012, 4th International Conference Proceedings
http://linked.open...in/vavai/riv/obor	JA
http://linked.open...ichTvurcuVysledku	8 (xsd:int)
http://linked.open...cetTvurcuVysledku	8 (xsd:int)
http://linked.open...vavai/riv/projekt	Advanced Microscopy and Spectroscopy Platform for Research and Development in Nano and Microtechnologies - AMISPEC Optimization of electron-beam production technology APPLICATION LABORATORIES OF ADVANCED MICROTECHNOLOGIES AND NANOTECHNOLOGIES
http://linked.open...UplatneniVysledku	2012
http://linked.open...iv/tvurceVysledku	Horáček, Miroslav Matějka, Milan Urbánek, Michal Bok, Jan Kolařík, Vladimír Matějka, František Král, Stanislav Krátký, Stanislav
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2012-10-23 (xsd:date)
number of pages	4 (xsd:int)
http://purl.org/ne...btex#hasPublisher	TANGER Ltd
https://schema.org/isbn	978-80-87294-32-1
is http://linked.open...avai/riv/vysledek of	Calibration specimens for microscopy

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