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Description
  • Mechanismy zodpovědné za kontrast mezi různě dopovanými oblastmi polovodiče, pozorovaný v elektronově mikroskopických snímcích, jsou diskutovány z hlediska klíčových faktorů určujících znaménko a velikost kontrastu. Je podán přehled experimentálních dat získaných pomocí rastrovacího elektronového mikroskopu (REM), rastrovacího nízkoenergiového elektronového mikroskopu a fotoelektronového emisního mikroskopu, spolu s návody, které odtud vyplývají pro sestavení modelu kontrastního mechanismu. (cs)
  • Mechanisms responsible for the contrast between differently doped areas in semiconductors, which is observed in electron micrographs, is discussed as regards the key factors determining the sign and magnitude of the contrast. Experimental data obtained by means of the scanning electron microscope (SEM), scanning low energy electron microscope and photoelectron emission microscope are reviewed together with hints following from them for compilation of a model of the contrast mechanism.
  • Mechanisms responsible for the contrast between differently doped areas in semiconductors, which is observed in electron micrographs, is discussed as regards the key factors determining the sign and magnitude of the contrast. Experimental data obtained by means of the scanning electron microscope (SEM), scanning low energy electron microscope and photoelectron emission microscope are reviewed together with hints following from them for compilation of a model of the contrast mechanism. (en)
Title
  • Dopant Contrast in Semiconductors as Interpretation Challenge at Imaging by Electrons
  • Dopant Contrast in Semiconductors as Interpretation Challenge at Imaging by Electrons (en)
  • Kontrast dopantu jako interpretační problém při zobrazování elektrony (cs)
skos:prefLabel
  • Dopant Contrast in Semiconductors as Interpretation Challenge at Imaging by Electrons
  • Dopant Contrast in Semiconductors as Interpretation Challenge at Imaging by Electrons (en)
  • Kontrast dopantu jako interpretační problém při zobrazování elektrony (cs)
skos:notation
  • RIV/68081731:_____/07:00082251!RIV07-AV0-68081731
http://linked.open.../vavai/riv/strany
  • 936;939
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA202/04/0281), Z(AV0Z20650511)
http://linked.open...iv/cisloPeriodika
  • 5
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 417953
http://linked.open...ai/riv/idVysledku
  • RIV/68081731:_____/07:00082251
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • electron microscopic contrasts; semiconductors; dopant contrast; scanning electron microscopy; scanning low energy electron microscopy; photoelectron emission microscopy (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • JP - Japonsko
http://linked.open...ontrolniKodProRIV
  • [9834F2169730]
http://linked.open...i/riv/nazevZdroje
  • Materials Transactions
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 48
http://linked.open...iv/tvurceVysledku
  • Hovorka, Miloš
  • Müllerová, Ilona
  • Frank, Luděk
  • Mika, Filip
  • Schönhense, G.
  • Valdaitsev, D.
http://linked.open...n/vavai/riv/zamer
issn
  • 1345-9678
number of pages
is http://linked.open...avai/riv/vysledek of
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