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  • This paper presents the results of a research concerning the fabrication of binary and multi-level phase-only diffractive optical elements (PDOE) using the technology of electron beam lithography. The electron beam lithography technology was used directly for modification of the reliefs of thin layers of PMMA resist such that the relief structure created in PMMA be optically functional for the given phase-only optical element. The paper inc ludes discussion of the issues pertaining to the capabilities of electron beam lithography to create defined 3D relief structures in thin layers of PMMA resist.
  • This paper presents the results of a research concerning the fabrication of binary and multi-level phase-only diffractive optical elements (PDOE) using the technology of electron beam lithography. The electron beam lithography technology was used directly for modification of the reliefs of thin layers of PMMA resist such that the relief structure created in PMMA be optically functional for the given phase-only optical element. The paper inc ludes discussion of the issues pertaining to the capabilities of electron beam lithography to create defined 3D relief structures in thin layers of PMMA resist. (en)
Title
  • Fabrication of Multilevel Diffractive Optical Elements using Electron Beam Lithography.
  • Fabrication of Multilevel Diffractive Optical Elements using Electron Beam Lithography. (en)
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  • Fabrication of Multilevel Diffractive Optical Elements using Electron Beam Lithography.
  • Fabrication of Multilevel Diffractive Optical Elements using Electron Beam Lithography. (en)
skos:notation
  • RIV/68081731:_____/03:12030015!RIV/2004/AV0/A12004/N
http://linked.open.../vavai/riv/strany
  • 241 ; 244
http://linked.open...avai/riv/aktivita
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  • P(IBS2065014), Z(AV0Z2065902)
http://linked.open...vai/riv/dodaniDat
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  • 606989
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  • RIV/68081731:_____/03:12030015
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  • diffractive optical elements; multilevel phase-only DOE; computer created holograms (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [34B0C26A4FCA]
http://linked.open...v/mistoKonaniAkce
  • Malá Lučivá [SK]
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  • Žilina
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  • Proceedings of the 9th International Workshop on Applied Physics of Condensed Matter.
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  • Matějka, František
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http://linked.open...n/vavai/riv/zamer
number of pages
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  • Žilinská univerzita v Žiline. Elektrotechnická fakulta
https://schema.org/isbn
  • 80-8070-088-5
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