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  • GaN layers with < 0001 > crystallographic orientation, grown by low-pressure metal-organic vapour-phase epitaxy (MOVPE) on c-plane sapphire substrates, were implanted with 200 and 400 keV Sm+, Tm+, Eu+, Tb+ and Ho+ ions at fluencies of 1 x 10(15)-1 x 10(16) cm(-2). The composition of the ion-implanted layers and concentration profiles of the implanted atoms were studied by Rutherford Back-Scattering spectrometry (RBS). The profiles were compared to SRIM 2008 simulations. The structural properties of the ion-implanted layers were characterised by RBS-channelling and Raman spectroscopy. Changes in the surface morphology caused by the ion implantation were examined by Atomic Force Microscopy (AFM). A structural analysis showed a high disorder of the atoms close to the amorphised structure at the surface layer above an implantation fluence of 5 x 10(15) cm(-2) while lower disorder density was observed in the bulk according to the projected range of 400 keV ions. The post-implantation annealing induced significant changes only in the Sm and Eu depth profiles; a diffusion of rare-earths implanted at a fluence of 5 x 10(15) cm(-2) to the surface was observed. The annealing caused the reconstruction of the surface layer accompanied by surface-roughness enhancement.
  • GaN layers with < 0001 > crystallographic orientation, grown by low-pressure metal-organic vapour-phase epitaxy (MOVPE) on c-plane sapphire substrates, were implanted with 200 and 400 keV Sm+, Tm+, Eu+, Tb+ and Ho+ ions at fluencies of 1 x 10(15)-1 x 10(16) cm(-2). The composition of the ion-implanted layers and concentration profiles of the implanted atoms were studied by Rutherford Back-Scattering spectrometry (RBS). The profiles were compared to SRIM 2008 simulations. The structural properties of the ion-implanted layers were characterised by RBS-channelling and Raman spectroscopy. Changes in the surface morphology caused by the ion implantation were examined by Atomic Force Microscopy (AFM). A structural analysis showed a high disorder of the atoms close to the amorphised structure at the surface layer above an implantation fluence of 5 x 10(15) cm(-2) while lower disorder density was observed in the bulk according to the projected range of 400 keV ions. The post-implantation annealing induced significant changes only in the Sm and Eu depth profiles; a diffusion of rare-earths implanted at a fluence of 5 x 10(15) cm(-2) to the surface was observed. The annealing caused the reconstruction of the surface layer accompanied by surface-roughness enhancement. (en)
Title
  • A study of the structural properties of GaN implanted by various rare-earth ions
  • A study of the structural properties of GaN implanted by various rare-earth ions (en)
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  • A study of the structural properties of GaN implanted by various rare-earth ions
  • A study of the structural properties of GaN implanted by various rare-earth ions (en)
skos:notation
  • RIV/61389005:_____/13:00395263!RIV14-MSM-61389005
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  • I, P(GA106/09/0125), P(LM2011019), S
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  • 7
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  • 59111
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  • RIV/61389005:_____/13:00395263
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  • rare earth implantation; GaN; depth profiles; RBS; Raman spectroscopy; AFM (en)
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  • NL - Nizozemsko
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  • [33F299F20C21]
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  • Nuclear Instruments & Methods in Physics Research Section B
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  • 307
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  • Macková, Anna
  • Malinský, Petr
  • Mikulics, M.
  • Sedmidubský, D.
  • Sofer, Z.
  • Šimek, P.
  • Wilhelm, R. A.
http://linked.open...ain/vavai/riv/wos
  • 000321722200099
issn
  • 0168-583X
number of pages
http://bibframe.org/vocab/doi
  • 10.1016/j.nimb.2012.11.079
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