About: Comparative Study on Hydrogenated and Deuterated Amorphous Carbon Films Deposited by RF PECVD     Goto   Sponge   NotDistinct   Permalink

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  • The aim of this work is to characterize and compare the properties of hydrogenated carbon thin films (HDLC) and deuterated carbon thin films (DDLC) deposited by r.f. plasma enhanced chemical vapor deposition (PECVD) from two different precursor mixtures methane/hydrogen (CH4/H2) and methane/deuterium (CH4/D2) on single crystalline silicon substrates. Complete atomic compositions, including hydrogen and deuterium content, were determined by combination of RBS and ERD analyses. We focused our attention on the following coating properties: hardness, elastic modulus, fracture toughness, film-substrate adhesion and internal stress. The results were completed by advanced plasma diagnostics performed by means of optical emission spectroscopy (OES).
  • The aim of this work is to characterize and compare the properties of hydrogenated carbon thin films (HDLC) and deuterated carbon thin films (DDLC) deposited by r.f. plasma enhanced chemical vapor deposition (PECVD) from two different precursor mixtures methane/hydrogen (CH4/H2) and methane/deuterium (CH4/D2) on single crystalline silicon substrates. Complete atomic compositions, including hydrogen and deuterium content, were determined by combination of RBS and ERD analyses. We focused our attention on the following coating properties: hardness, elastic modulus, fracture toughness, film-substrate adhesion and internal stress. The results were completed by advanced plasma diagnostics performed by means of optical emission spectroscopy (OES). (en)
Title
  • Comparative Study on Hydrogenated and Deuterated Amorphous Carbon Films Deposited by RF PECVD
  • Comparative Study on Hydrogenated and Deuterated Amorphous Carbon Films Deposited by RF PECVD (en)
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  • Comparative Study on Hydrogenated and Deuterated Amorphous Carbon Films Deposited by RF PECVD
  • Comparative Study on Hydrogenated and Deuterated Amorphous Carbon Films Deposited by RF PECVD (en)
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  • RIV/61389005:_____/12:00388594!RIV13-AV0-61389005
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  • I, P(GA202/07/1669)
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  • 127831
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  • RIV/61389005:_____/12:00388594
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  • hydrogenated carbon thin films; deuterated carbon thin films; PECVD; RBS; ERDA; OES; coating properties (en)
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  • [8CA205FD356C]
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  • Alpe d´Huez
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  • Innsbruck
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  • Conference Series, XVIIIth Symposium on Atomic, Cluster and Surface Physics 2012
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  • Buršíková, V.
  • Mikšová, Romana
  • Peřina, Vratislav
  • Slavíček, P.
  • Mocanu, V.
  • Stoica, A.
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number of pages
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  • Innsbruck univesity press
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  • 978-3-902719-52-2
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