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  • Surface Enhanced Raman Scattering (SERS) on copper substrates of various morphologies, prepared by electrochemical deposition on platinum targets, was investigated. The substrate preparation procedures differed by the coating bath compositions, applied current densities and the duration of individual steps. The surface morphology of the substrates was visualized by means of Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM). SERS spectra of selected organic thiols were measured and the relation between SERS spectral intensity and the surface structure of SERS-active substrates was studied. It has been shown that good Raman surface enhancement can be achieved on the copper substrates prepared by electrochemical deposition from ammoniac baths. Copper substrates fabricated from acidic baths did not show efficient Raman surface enhancement. The results of microscopic measurements demonstrated that the average surface roughness value does not play a substantial role, whereas the shape of
  • Surface Enhanced Raman Scattering (SERS) on copper substrates of various morphologies, prepared by electrochemical deposition on platinum targets, was investigated. The substrate preparation procedures differed by the coating bath compositions, applied current densities and the duration of individual steps. The surface morphology of the substrates was visualized by means of Atomic Force Microscopy (AFM) and Scanning Electron Microscopy (SEM). SERS spectra of selected organic thiols were measured and the relation between SERS spectral intensity and the surface structure of SERS-active substrates was studied. It has been shown that good Raman surface enhancement can be achieved on the copper substrates prepared by electrochemical deposition from ammoniac baths. Copper substrates fabricated from acidic baths did not show efficient Raman surface enhancement. The results of microscopic measurements demonstrated that the average surface roughness value does not play a substantial role, whereas the shape of (en)
Title
  • Characterization of copper SERS-active substrates prepared by electrochemical deposition
  • Characterization of copper SERS-active substrates prepared by electrochemical deposition (en)
skos:prefLabel
  • Characterization of copper SERS-active substrates prepared by electrochemical deposition
  • Characterization of copper SERS-active substrates prepared by electrochemical deposition (en)
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  • RIV/60461373:22340/09:00021828!RIV10-MSM-22340___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GD104/08/H055), P(KAN208240651), Z(MSM6046137306), Z(MSM6046137307)
http://linked.open...iv/cisloPeriodika
  • 18
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 306769
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  • RIV/60461373:22340/09:00021828
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Surface Enhanced Raman Scattering (SERS); Atomic Force Microscopy (AFM); Scanning Electron Microscopy (SEM); Copper; Electrochemical deposition Surface Enhanced Raman Scattering (SERS); Atomic Force Microscopy (AFM); Scanning Electron Microscopy (SEM); Copper; Electrochemical deposition (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV
  • [AA3ED74C52A6]
http://linked.open...i/riv/nazevZdroje
  • Applied Surface Science
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 255
http://linked.open...iv/tvurceVysledku
  • Štěpánek, František
  • Matějka, Pavel
  • Čejková, Jitka
  • Prokopec, Vadym
  • Brázdová, Soňa
  • Kokaislová, A.
http://linked.open...ain/vavai/riv/wos
  • 000267469500006
http://linked.open...n/vavai/riv/zamer
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  • 0169-4332
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  • 22340
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