About: Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target

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An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	Pulsed magnetron sputtering of titanium films was performed using a directly water-cooled target and a hot target of 100 mm diameter to investigate the effect of the target temperature on the sputtering process. The repetition frequency of the pulsed dc power supply was 10 kHz at a 20% duty cycle and an argon pressure of 0.5 Pa. Almost constant target temperatures during depositions with the hot target, being heated by ion bombardment itself, were controlled by preset values of the average pulse current at a target power density in a pulse up to 340 W per square centimeter. It has been shown that an increase in the surface temperature of the hot target resulted in a rise in the deposition rate (up to 1.9 times) at a decreasing average pulse voltage (up to 1.5 times) compared to the cooled target with the same average pulse target current density (up to 0.33 A per square centimeter). Pulsed magnetron sputtering of titanium films was performed using a directly water-cooled target and a hot target of 100 mm diameter to investigate the effect of the target temperature on the sputtering process. The repetition frequency of the pulsed dc power supply was 10 kHz at a 20% duty cycle and an argon pressure of 0.5 Pa. Almost constant target temperatures during depositions with the hot target, being heated by ion bombardment itself, were controlled by preset values of the average pulse current at a target power density in a pulse up to 340 W per square centimeter. It has been shown that an increase in the surface temperature of the hot target resulted in a rise in the deposition rate (up to 1.9 times) at a decreasing average pulse voltage (up to 1.5 times) compared to the cooled target with the same average pulse target current density (up to 0.33 A per square centimeter). (en)
Title	Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target (en)
skos:prefLabel	Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target (en)
skos:notation	RIV/49777513:23640/09:00502104!RIV10-MSM-23640___
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM4977751302)
http://linked.open...vai/riv/dodaniDat	2010
http://linked.open...aciTvurceVysledku	Burcalová, Kristýna Zuštin, Branislav Vlček, Jaroslav Rezek, Jiří Tesař, Jiří
http://linked.open.../riv/druhVysledku	D - Článek ve sborníku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Nové technologie - výzkumné centrum
http://linked.open...dnocenehoVysledku	337682
http://linked.open...ai/riv/idVysledku	RIV/49777513:23640/09:00502104
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	magnetron sputtering; hot target; HPPMS (en)
http://linked.open.../riv/klicoveSlovo	magnetron sputtering hot target HPPMS
http://linked.open...ontrolniKodProRIV	[E11CE48A9D90]
http://linked.open...v/mistoKonaniAkce	Santa Clara
http://linked.open...i/riv/mistoVydani	Santa Clara
http://linked.open...i/riv/nazevZdroje	Society of Vacuum Coaters: Technical Conference Proceedings
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	5 (xsd:int)
http://linked.open...cetTvurcuVysledku	5 (xsd:int)
http://linked.open...UplatneniVysledku	2009
http://linked.open...iv/tvurceVysledku	Vlček, Jaroslav Tesař, Jiří Rezek, Jiří Burcalová, Kristýna Zuštin, Branislav
http://linked.open...vavai/riv/typAkce	WRD - Světová
http://linked.open.../riv/zahajeniAkce	2009-05-14 (xsd:date)
http://linked.open...n/vavai/riv/zamer	Procesy ve výbojovém plazmatu a nové tenkovrstvé materiály s unikátními vlastnostmi
number of pages	5 (xsd:int)
http://purl.org/ne...btex#hasPublisher	Society of Vacuum Coaters
https://schema.org/isbn	978-1-878068-29-3
http://localhost/t...ganizacniJednotka	23640
is http://linked.open...avai/riv/vysledek of	Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target Pulsed Magnetron Sputtering of Metallic Films Using a Hot Target

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