About: Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	High power impulse magnetron sputtering of zirconium was investigated at the average target power density of up to 2.22 kW/cm2 in a pulse. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter at the argon pressure of 1 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 4% to 10%. Time-averaged mass spectroscopy was carried out at the substrate positions of 100 and 200 mm from the target. The increase in the average target power density from 0.97 kW/cm2 to 2.22 kW/cm2 in shortened voltage pulses (from 200 to 80 microseconds) at an average target power density of 100 W/cm2 in a period led to high fractions (21%-32%) of doubly charged zirconium ions in total ion fluxes onto the substrate located 100 mm from the target. However, the respective fractions of singly charged zirconium ions decreased from 23% to 3%. It was observed that ion energy distributions were extended to high energies (up to 100 eV relative to the ground High power impulse magnetron sputtering of zirconium was investigated at the average target power density of up to 2.22 kW/cm2 in a pulse. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter at the argon pressure of 1 Pa. The repetition frequency was 500 Hz at duty cycles ranging from 4% to 10%. Time-averaged mass spectroscopy was carried out at the substrate positions of 100 and 200 mm from the target. The increase in the average target power density from 0.97 kW/cm2 to 2.22 kW/cm2 in shortened voltage pulses (from 200 to 80 microseconds) at an average target power density of 100 W/cm2 in a period led to high fractions (21%-32%) of doubly charged zirconium ions in total ion fluxes onto the substrate located 100 mm from the target. However, the respective fractions of singly charged zirconium ions decreased from 23% to 3%. It was observed that ion energy distributions were extended to high energies (up to 100 eV relative to the ground (en)
Title	Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium (en)
skos:prefLabel	Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium (en)
skos:notation	RIV/49777513:23520/10:00503522!RIV11-MSM-23520___
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika	6
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Vlček, Jaroslav Rezek, Jiří Lazar, Jan
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	264901
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/10:00503522
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	HiPIMS; mass spectroscopy; ion energy distribution function; deposition characteristics (en)
http://linked.open.../riv/klicoveSlovo	ion energy distribution function HiPIMS mass spectroscopy deposition characteristics
http://linked.open...odStatuVydavatele	US - Spojené státy americké
http://linked.open...ontrolniKodProRIV	[F8591E2ADA81]
http://linked.open...i/riv/nazevZdroje	Journal of Applied Physics
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	3 (xsd:int)
http://linked.open...cetTvurcuVysledku	3 (xsd:int)
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	108
http://linked.open...iv/tvurceVysledku	Vlček, Jaroslav Lazar, Jan Rezek, Jiří
http://linked.open...ain/vavai/riv/wos	000282646400017
http://linked.open...n/vavai/riv/zamer	Procesy ve výbojovém plazmatu a nové tenkovrstvé materiály s unikátními vlastnostmi
issn	0021-8979
number of pages	9 (xsd:int)
http://localhost/t...ganizacniJednotka	23520
is http://linked.open...avai/riv/vysledek of	Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

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