About: A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	We present a phenomenological equilibrium model applicable to high-power pulsed dc magnetron sputtering with relatively long steady-state discharge regimes established during pulses. The model makes it possible to calculate the normalized rate coefficient (determining the deposition rate of films per target power density), and the ionized fraction of target material atoms in the flux onto the substrate, as functions of the magnetron voltage and the fraction of target material ions in the total ion flux onto the target (being related to an applied target power density). We used this model to clarify the large differences between the corresponding deposition characteristics of copper and titanium measured by us during high-power pulsed dc magnetron sputtering of the two materials. We investigated the effects of higher losses of the target material ions to chamber walls and of reduced additional ionization in the plasma bulk in the magnetron system with a weaker magnetic confinement. We present a phenomenological equilibrium model applicable to high-power pulsed dc magnetron sputtering with relatively long steady-state discharge regimes established during pulses. The model makes it possible to calculate the normalized rate coefficient (determining the deposition rate of films per target power density), and the ionized fraction of target material atoms in the flux onto the substrate, as functions of the magnetron voltage and the fraction of target material ions in the total ion flux onto the target (being related to an applied target power density). We used this model to clarify the large differences between the corresponding deposition characteristics of copper and titanium measured by us during high-power pulsed dc magnetron sputtering of the two materials. We investigated the effects of higher losses of the target material ions to chamber walls and of reduced additional ionization in the plasma bulk in the magnetron system with a weaker magnetic confinement. (en)
Title	A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering (en)
skos:prefLabel	A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering (en)
skos:notation	RIV/49777513:23520/10:00503516!RIV11-MSM-23520___
http://linked.open...avai/riv/aktivita	Z
http://linked.open...avai/riv/aktivity	Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika	6
http://linked.open...vai/riv/dodaniDat	2011
http://linked.open...aciTvurceVysledku	Burcalová, Kristýna Vlček, Jaroslav
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	244856
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/10:00503516
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	high-power magnetron sputtering; pulsed sputtering; phenomenological discharge model; deposition characteristics; sputtering of copper and titanium (en)
http://linked.open.../riv/klicoveSlovo	deposition characteristics high-power magnetron sputtering phenomenological discharge model pulsed sputtering sputtering of copper and titanium
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[171928349CD7]
http://linked.open...i/riv/nazevZdroje	Plasma Sources Science and Technology
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	2 (xsd:int)
http://linked.open...UplatneniVysledku	2010
http://linked.open...v/svazekPeriodika	19
http://linked.open...iv/tvurceVysledku	Vlček, Jaroslav Burcalová, Kristýna
http://linked.open...ain/vavai/riv/wos	000284689600010
http://linked.open...n/vavai/riv/zamer	Procesy ve výbojovém plazmatu a nové tenkovrstvé materiály s unikátními vlastnostmi
issn	0963-0252
number of pages	12 (xsd:int)
http://localhost/t...ganizacniJednotka	23520
is http://linked.open...avai/riv/vysledek of	A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering

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