About: Formation of crystalline Al-Ti-O thin films and their properties     Goto   Sponge   NotDistinct   Permalink

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  • The article reports on the effect of addition of Ti into Al2O3 films with Ti on their structure, mechanical properties and oxidation resistance. The main aim of the investigation was to prepare crystalline Al-Ti-O films at substrate temperatures Ts%22500 °C. The films with three different compositions (41, 43 and 67 mol.% Al2O3) were reactively sputtered from a composed Al/Ti target and their properties were characterized using X-Ray diffraction (XRD), X-ray fluorescent spectroscopy (XRF), microhardness testing, and thermogravimetric analysis (TGA).
  • The article reports on the effect of addition of Ti into Al2O3 films with Ti on their structure, mechanical properties and oxidation resistance. The main aim of the investigation was to prepare crystalline Al-Ti-O films at substrate temperatures Ts%22500 °C. The films with three different compositions (41, 43 and 67 mol.% Al2O3) were reactively sputtered from a composed Al/Ti target and their properties were characterized using X-Ray diffraction (XRD), X-ray fluorescent spectroscopy (XRF), microhardness testing, and thermogravimetric analysis (TGA). (en)
  • Článek popisuje vliv příměsi Ti do Al2O3 vrstev na jejich strukturu, mechanické vlastnosti a oxidační odolnost. Hlavní cíl výzkumu bylo připravit krystalické Al-Ti-O vrstvy při teplotě substrátu Ts%22500 °C. Vrstvy se třemi rozdílnými složeními (41, 43 and 67 mol.% Al2O3) byly reaktivně naprašovány ze složeného Al/Ti terče a jejich vlastnosti byly charakterizovány rentgenovou difrakcí (XRD), rentgen-fluorescenční spektroskopií (XRF), mikrotvrdoměrem a termogravimetrickou analýzou (TGA). (cs)
Title
  • Formation of crystalline Al-Ti-O thin films and their properties
  • Formation of crystalline Al-Ti-O thin films and their properties (en)
  • Formování krystalických Al-Ti-O tenkých vrstev a jejich vlastnosti (cs)
skos:prefLabel
  • Formation of crystalline Al-Ti-O thin films and their properties
  • Formation of crystalline Al-Ti-O thin films and their properties (en)
  • Formování krystalických Al-Ti-O tenkých vrstev a jejich vlastnosti (cs)
skos:notation
  • RIV/49777513:23520/08:00500520!RIV09-MSM-23520___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 24
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 368363
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/08:00500520
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Al-Ti-O thin film; Structure; Crystallization; Mechanical properties, Oxidation resistance; Reactive magnetron sputtering (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [80B6174A11B6]
http://linked.open...i/riv/nazevZdroje
  • Surface and Coatings Technology
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 202
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Zeman, Petr
  • Tölg, Tomáš
  • Čerstvý, Radomír
  • Šatava, Václav
http://linked.open...ain/vavai/riv/wos
  • 000260267100040
http://linked.open...n/vavai/riv/zamer
issn
  • 0257-8972
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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