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Description
  • Tento článek pojednává o vlivu přidání H2 do výbojové Ar+O2 směsi na vlastní proces dc reaktivního magnetronového naprašování oxidů a na elektrickou vodivost transparentních oxidových vrstev. Byly zkoumány čtyři systémy: In-Sn-O, TiO2, Ti-Y-O a ZrO2. Bylo zjištěno, že přidání H2 do Ar+O2 výbojové směsi má za následek: pokles výbojového napětí, výraznou změnu závislosti a dramatický pokles elektrické rezistivity naprášených oxidových vrstev. Tyto výsledky jsou podrobně diskutovány. (cs)
  • The article reports on the effect of addition of H2 into a mixture of Ar+O2 on the process of dc reactive magnetron sputtering of oxides and the electrical conductivity of transparent oxide films. Four systems were investigated: In-Sn-O, TiO2, Ti-Y-O a ZrO2 fils. It was found that the addition of H2 into Ar+O2 sputtering gas mixture results in: decrease in the magnetron discharge voltage , strong change of the dependence and dramatic decrease of electrical resistivity of sputtered transparent oxide films. These results are described in detail.
  • The article reports on the effect of addition of H2 into a mixture of Ar+O2 on the process of dc reactive magnetron sputtering of oxides and the electrical conductivity of transparent oxide films. Four systems were investigated: In-Sn-O, TiO2, Ti-Y-O a ZrO2 fils. It was found that the addition of H2 into Ar+O2 sputtering gas mixture results in: decrease in the magnetron discharge voltage , strong change of the dependence and dramatic decrease of electrical resistivity of sputtered transparent oxide films. These results are described in detail. (en)
Title
  • Effect of Hydrogen on Reactive Sputtering of Transparent Oxide Films
  • Effect of Hydrogen on Reactive Sputtering of Transparent Oxide Films (en)
  • Vliv vodíku na reaktivní naprašování transparentních oxidových vrstev (cs)
skos:prefLabel
  • Effect of Hydrogen on Reactive Sputtering of Transparent Oxide Films
  • Effect of Hydrogen on Reactive Sputtering of Transparent Oxide Films (en)
  • Vliv vodíku na reaktivní naprašování transparentních oxidových vrstev (cs)
skos:notation
  • RIV/49777513:23520/07:00000204!RIV08-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 0
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  • Z(MSM4977751302)
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http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
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  • 418956
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/07:00000204
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  • coatings; conductive transparent oxides; dc reactive magnetron sputtering; electrical conductivity; films; indium tin oxide (ITO); optical coatings (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [59F36DADFCD6]
http://linked.open...i/riv/nazevZdroje
  • Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
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http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Ondok, Václav
http://linked.open...n/vavai/riv/zamer
issn
  • 1612-8850
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  • 23520
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