About: Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering     Goto   Sponge   NotDistinct   Permalink

An Entity of Type : http://linked.opendata.cz/ontology/domain/vavai/Vysledek, within Data Space : linked.opendata.cz associated with source document(s)

AttributesValues
rdf:type
Description
  • In this work, a systematic investigation of reactive magnetron sputtering of hard quaternary Si-B-C-N materials has been carried out. The Si-B-C-N films were deposited on Si and SiC substrates by dc magnetron co sputtering using a single C-Si-B or B4C-Si target in nitrogen-argon gas mixtures. Elemental compositions of the films, their bonding structure, nanostructure, and mechanical, tribological and optical properties, together with their oxidation resistance in air, were controlled by the Si fraction in the magnetron target erosion area, the Ar fraction in the gas mixture, the rf induced negative substrate bias voltage and the substrate temperature. The energy and flux of ions bombarding the growing films were determined on the basis of the measured discharge characteristics.
  • In this work, a systematic investigation of reactive magnetron sputtering of hard quaternary Si-B-C-N materials has been carried out. The Si-B-C-N films were deposited on Si and SiC substrates by dc magnetron co sputtering using a single C-Si-B or B4C-Si target in nitrogen-argon gas mixtures. Elemental compositions of the films, their bonding structure, nanostructure, and mechanical, tribological and optical properties, together with their oxidation resistance in air, were controlled by the Si fraction in the magnetron target erosion area, the Ar fraction in the gas mixture, the rf induced negative substrate bias voltage and the substrate temperature. The energy and flux of ions bombarding the growing films were determined on the basis of the measured discharge characteristics. (en)
  • Byl proveden systematický výzkum reaktivního magnetronového naprašování tvrdých kvaternárních Si-B-C-N materiálů. Si-B-C-N vrstvy byly deponovány na Si a SiC substráty rozprašováním C-Si-B nebo B4C-Si terče ve směsi dusíku a argonu. Prvkové složení vrstev, jejich vazebná struktura, nanostruktura, mechanické, tribologické a optické vlastnosti společně s oxidační odolností byly kontrolovány obsahem Si v erozní zóně terče, obsahem Ar ve výbojové směsi, záporným radiofrekvenčně indukovaným předpětím na substrátu a teplotou substrátu. Energie a tok iontů dopadajících na rostoucí vrstvy byly určeny z měřených výbojových charakteristik. Hmotnostní spektroskopie byla použita pro zjištění sl (cs)
Title
  • Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering
  • Nové kvaternární Si-B-C-N vrstvy připravené reaktivním magnetronovým naprašováním (cs)
  • Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering (en)
skos:prefLabel
  • Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering
  • Nové kvaternární Si-B-C-N vrstvy připravené reaktivním magnetronovým naprašováním (cs)
  • Novel quaternary Si-B-C-N films prepared by reactive magnetron sputtering (en)
skos:notation
  • RIV/49777513:23520/07:00000023!RIV08-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 362-362
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM4977751302)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 437920
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/07:00000023
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Si-B-C-N films; magnetron sputtering; hardness; amorphous nanostructure; oxidation resistance (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [A802AD5F3470]
http://linked.open...v/mistoKonaniAkce
  • Kyoto
http://linked.open...i/riv/mistoVydani
  • Kyoto
http://linked.open...i/riv/nazevZdroje
  • 18th International Symposium on Plasma Chemistry
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Houška, Jiří
  • Zeman, Petr
  • Vlček, Jaroslav
  • Peřina, Vratislav
  • Potocký, Štěpán
  • Čapek, Jiří
  • Hřeben, Stanislav
  • Kalaš, Jiří
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
http://linked.open...n/vavai/riv/zamer
number of pages
http://purl.org/ne...btex#hasPublisher
  • International Plasma Chemistry Society
https://schema.org/isbn
  • 978-4-9903773-2-8
http://localhost/t...ganizacniJednotka
  • 23520
is http://linked.open...avai/riv/vysledek of
Faceted Search & Find service v1.16.118 as of Jun 21 2024


Alternative Linked Data Documents: ODE     Content Formats:   [cxml] [csv]     RDF   [text] [turtle] [ld+json] [rdf+json] [rdf+xml]     ODATA   [atom+xml] [odata+json]     Microdata   [microdata+json] [html]    About   
This material is Open Knowledge   W3C Semantic Web Technology [RDF Data] Valid XHTML + RDFa
OpenLink Virtuoso version 07.20.3240 as of Jun 21 2024, on Linux (x86_64-pc-linux-gnu), Single-Server Edition (126 GB total memory, 47 GB memory in use)
Data on this page belongs to its respective rights holders.
Virtuoso Faceted Browser Copyright © 2009-2024 OpenLink Software