About: Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films

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About: Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	CNx films were deposited on Si(100) substrates at a substrate temperature using DC magnetron sputtering of a high-purity graphite target in pure nitrogen. The film characteristics were primarily controlled by the pressure,p, (0.05 to 5 Pa), the discharge current on the magnetron target, Im, (0.5 to 3 A), and the RF-induced negative substrate bias voltage, Ub, (-300 to -1200 V). A complex relationship between the process parameters and the film characteristics was investigated on the basis of correlations between the process parameters and the respective internal plasma parameters, such as ion bombardment characteristics and the densities of N atoms and CN radicals in front of the substrate. CNx films were deposited on Si(100) substrates at a substrate temperature using DC magnetron sputtering of a high-purity graphite target in pure nitrogen. The film characteristics were primarily controlled by the pressure,p, (0.05 to 5 Pa), the discharge current on the magnetron target, Im, (0.5 to 3 A), and the RF-induced negative substrate bias voltage, Ub, (-300 to -1200 V). A complex relationship between the process parameters and the film characteristics was investigated on the basis of correlations between the process parameters and the respective internal plasma parameters, such as ion bombardment characteristics and the densities of N atoms and CN radicals in front of the substrate. (en)
Title	Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films (en)
skos:prefLabel	Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films Characterization of ion bombardment and optical emission spectroscopy in magnetron discharges for reactive sputtering of hard carbon nitride films (en)
skos:notation	RIV/49777513:23520/00:00052714!RIV/2001/MSM/235201/N
http://linked.open.../vavai/riv/strany	117
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GV106/96/K245), P(VS96059), Z(MSM 235200002)
http://linked.open...iv/cisloPeriodika	1
http://linked.open...vai/riv/dodaniDat	2001
http://linked.open...aciTvurceVysledku	Vlček, Jaroslav Rusňák, Karel
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Západočeská univerzita v Plzni / Fakulta aplikovaných věd
http://linked.open...dnocenehoVysledku	706580
http://linked.open...ai/riv/idVysledku	RIV/49777513:23520/00:00052714
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open...odStatuVydavatele	FR - Francouzská republika
http://linked.open...ontrolniKodProRIV	[1CEE4A495925]
http://linked.open...i/riv/nazevZdroje	TATF' 2000
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	2 (xsd:int)
http://linked.open...cetTvurcuVysledku	4 (xsd:int)
http://linked.open...vavai/riv/projekt	Hard and superhard coatings prepared by unconventional plasma processes A scientific team for plasma physics and plasma technologies
http://linked.open...UplatneniVysledku	2000
http://linked.open...v/svazekPeriodika	Roč. 7
http://linked.open...iv/tvurceVysledku	Vlček, Jaroslav Rusňák, Karel
http://linked.open...n/vavai/riv/zamer	http://linked.opendata.cz/resource/domain/vavai/zamer/MSM%20235200002
issn	12660167
number of pages	3 (xsd:int)
http://localhost/t...ganizacniJednotka	23520

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