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  • The influence of atomic hydrogen on the Si(100) substrate with submonolayer gallium surface phases - (2x3), (2x2) and (8x1) - as well as the deposition of gallium on monohydride terminated Si(100)-(2x1)-H surface were studied by synchrotron radiation photoelectron spectroscopy (SR-PES) and low energy electron diffraction (LEED) and compared with similar metal/Si systems. It was found that gallium deposition on the Si(100)-(2x1)-H surface at elevated temperature (400 C) leads to a complete hydrogen desorption and formation of the same gallium surface phases as on the bare Si(100)-(2x1). Exposing the Si(100) substrate with (2x3)-Ga and (2x2)-Ga surface phases to atomic hydrogen results in the formation of gallium nanoclusters, surrounded by the Si(100)-(2x1)-H surface. These clusters have more than 2 monolayers in height and cover approximately 20 - 26 % of surface, depending on the initial coverage. The results indicate that the cluster size and density may be controlled by initial Ga coverage and poss
  • The influence of atomic hydrogen on the Si(100) substrate with submonolayer gallium surface phases - (2x3), (2x2) and (8x1) - as well as the deposition of gallium on monohydride terminated Si(100)-(2x1)-H surface were studied by synchrotron radiation photoelectron spectroscopy (SR-PES) and low energy electron diffraction (LEED) and compared with similar metal/Si systems. It was found that gallium deposition on the Si(100)-(2x1)-H surface at elevated temperature (400 C) leads to a complete hydrogen desorption and formation of the same gallium surface phases as on the bare Si(100)-(2x1). Exposing the Si(100) substrate with (2x3)-Ga and (2x2)-Ga surface phases to atomic hydrogen results in the formation of gallium nanoclusters, surrounded by the Si(100)-(2x1)-H surface. These clusters have more than 2 monolayers in height and cover approximately 20 - 26 % of surface, depending on the initial coverage. The results indicate that the cluster size and density may be controlled by initial Ga coverage and poss (en)
Title
  • Atomic hydrogen induced gallium nanocluster formation on the Si(100) surface
  • Atomic hydrogen induced gallium nanocluster formation on the Si(100) surface (en)
skos:prefLabel
  • Atomic hydrogen induced gallium nanocluster formation on the Si(100) surface
  • Atomic hydrogen induced gallium nanocluster formation on the Si(100) surface (en)
skos:notation
  • RIV/00216305:26210/08:PU74401!RIV10-MSM-26210___
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GEFON/06/E001), P(IAA1010413), P(KAN400100701), P(LC06040), Z(MSM0021630508)
http://linked.open...iv/cisloPeriodika
  • 10
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 357257
http://linked.open...ai/riv/idVysledku
  • RIV/00216305:26210/08:PU74401
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Gallium, Ga, Silicon, Si(100), Hydrogen, Surface structure, Nanoclusters, Low energy electron diffraction (LEED), Synchrotron radiation photoelectron spectroscopy (SR-PES), Photoemission (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • NL - Nizozemsko
http://linked.open...ontrolniKodProRIV
  • [8F00B0F2E264]
http://linked.open...i/riv/nazevZdroje
  • Surface Science
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...v/svazekPeriodika
  • 602
http://linked.open...iv/tvurceVysledku
  • Kolíbal, Miroslav
  • Mach, Jindřich
  • Šikola, Tomáš
  • Čechal, Jan
  • Potoček, Michal
http://linked.open...n/vavai/riv/zamer
issn
  • 0039-6028
number of pages
http://localhost/t...ganizacniJednotka
  • 26210
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