About: Measurement of plasma potential waveform in capacitive discharge

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The uncompensated probe was used for measurement of plasma potential waveforms. A method is presented that enables calculation of probe sheath voltage and, consequently, enables to get the plasma potential waveform by means of probe measurements. The method was successfully tested in nitrogen plasma. In order to get reliable results the method requires knowledge of plasma parameters which can be measured by a compensated Langmuir probe. It was shown that the waveforms of plasma potential and probe voltage differ significantly. Therefore, the influence of the probe sheath voltage whose calculation is presented can not be neglected by measurement of the plasma potential. At low pressure, the plasma potential waveform contained high amount of higher harmonic frequencies that were ignited namely during the fast expansion of the sheath at the powered electrode. The uncompensated probe was used for measurement of plasma potential waveforms. A method is presented that enables calculation of probe sheath voltage and, consequently, enables to get the plasma potential waveform by means of probe measurements. The method was successfully tested in nitrogen plasma. In order to get reliable results the method requires knowledge of plasma parameters which can be measured by a compensated Langmuir probe. It was shown that the waveforms of plasma potential and probe voltage differ significantly. Therefore, the influence of the probe sheath voltage whose calculation is presented can not be neglected by measurement of the plasma potential. At low pressure, the plasma potential waveform contained high amount of higher harmonic frequencies that were ignited namely during the fast expansion of the sheath at the powered electrode. (en)
Title	Measurement of plasma potential waveform in capacitive discharge Measurement of plasma potential waveform in capacitive discharge (en)
skos:prefLabel	Measurement of plasma potential waveform in capacitive discharge Measurement of plasma potential waveform in capacitive discharge (en)
skos:notation	RIV/00216224:14310/09:00049592!RIV12-GA0-14310___
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA202/07/1669), Z(MSM0021622411)
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Dvořák, Pavel
http://linked.open.../riv/druhVysledku	O - Ostatní výsledky nezařaditelné do žádného z výše uvedených druhů výsledku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Masarykova univerzita / Přírodovědecká fakulta
http://linked.open...dnocenehoVysledku	325046
http://linked.open...ai/riv/idVysledku	RIV/00216224:14310/09:00049592
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	plasma potential; higher harmonic frequencies; capacitively coupled discharge; plasma (en)
http://linked.open.../riv/klicoveSlovo	higher harmonic frequencies plasma plasma potential capacitively coupled discharge
http://linked.open...ontrolniKodProRIV	[EA1212630345]
http://linked.open...in/vavai/riv/obor	BL
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	1 (xsd:int)
http://linked.open...vavai/riv/projekt	Deposition of thermomehanically stable nanostructured diamond-like thin films in dual frequency capacitive discharges
http://linked.open...UplatneniVysledku	2009
http://linked.open...iv/tvurceVysledku	Dvořák, Pavel
http://linked.open...n/vavai/riv/zamer	Study and application of plasma chemical reactions in non-isothermic low temperature plasma and its interaction with solid surface
http://localhost/t...ganizacniJednotka	14310

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