About: Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films.

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About: Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films. Goto Sponge NotDistinct Permalink

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rdf:type	skos:Concept http://linked.opendata.cz/ontology/domain/vavai/Vysledek
Description	The deposition of Ge(25)Sb(10)S(65) and Ge(25)Sb(10)Se(65) amorphous chalcogenide thin films was performed by radio-frequency magnetron sputtering and pulsed laser deposition technique. The deposited layers were characterized by studying their morphology, topography, chemical composition, structure, and optical functions permitting a direct comparison of two deposition methods for obtaining attractive amorphous chalcogenide films. Reactive ion etching was then used to pattern rib/ridge waveguides in sulfide and selenide films with low surface roughness, vertical sidewalls, and reasonable etching rate. Optical losses of fabricated waveguides were measured at 1550 nm with values better than 1 dB/cm obtained for sulfide/selenide films deposited by both techniques. The deposition of Ge(25)Sb(10)S(65) and Ge(25)Sb(10)Se(65) amorphous chalcogenide thin films was performed by radio-frequency magnetron sputtering and pulsed laser deposition technique. The deposited layers were characterized by studying their morphology, topography, chemical composition, structure, and optical functions permitting a direct comparison of two deposition methods for obtaining attractive amorphous chalcogenide films. Reactive ion etching was then used to pattern rib/ridge waveguides in sulfide and selenide films with low surface roughness, vertical sidewalls, and reasonable etching rate. Optical losses of fabricated waveguides were measured at 1550 nm with values better than 1 dB/cm obtained for sulfide/selenide films deposited by both techniques. (en)
Title	Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films. Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films. (en)
skos:prefLabel	Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films. Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films. (en)
skos:notation	RIV/00216275:25310/11:39892140!RIV12-GA0-25310___
http://linked.open...avai/predkladatel	Fakulta chemicko-technologická
http://linked.open...avai/riv/aktivita	P Z
http://linked.open...avai/riv/aktivity	P(GA104/08/0229), Z(MSM0021627501)
http://linked.open...iv/cisloPeriodika	5
http://linked.open...vai/riv/dodaniDat	2012
http://linked.open...aciTvurceVysledku	Němec, Petr
http://linked.open.../riv/druhVysledku	J - Článek v odborném periodiku
http://linked.open...iv/duvernostUdaju	S - Úplné a pravdivé údaje nepodléhající ochraně podle zvláštních právních předpisů
http://linked.open...titaPredkladatele	Univerzita Pardubice / Fakulta chemicko-technologická
http://linked.open...dnocenehoVysledku	231698
http://linked.open...ai/riv/idVysledku	RIV/00216275:25310/11:39892140
http://linked.open...riv/jazykVysledku	eng - angličtina
http://linked.open.../riv/klicovaSlova	thin films; amorphous chalcogenides; pulsed laser deposition; sputtering (en)
http://linked.open.../riv/klicoveSlovo	sputtering amorphous chalcogenides pulsed laser deposition thin films
http://linked.open...odStatuVydavatele	GB - Spojené království Velké Británie a Severního Irska
http://linked.open...ontrolniKodProRIV	[26ADB22B5484]
http://linked.open...i/riv/nazevZdroje	International Journal of Applied Ceramic Technology
http://linked.open...in/vavai/riv/obor	BH
http://linked.open...ichTvurcuVysledku	1 (xsd:int)
http://linked.open...cetTvurcuVysledku	9 (xsd:int)
http://linked.open...vavai/riv/projekt	Thin films deposited by pulsed lasers
http://linked.open...UplatneniVysledku	2011
http://linked.open...v/svazekPeriodika	8
http://linked.open...iv/tvurceVysledku	Němec, Petr Nazabal, Virginie Adam, J.-L. Brandily-Anne, M.-L. Charpentier, F. Charrier, J. Guin, J.-P. Lhermite, H. Moréac, A.
http://linked.open...ain/vavai/riv/wos	000297249200002
http://linked.open...n/vavai/riv/zamer	Aimed preparation of special compounds and materials and investigation of their physical and chemical properties and supramolecular structures
issn	1546-542X
number of pages	11 (xsd:int)
http://bibframe.org/vocab/doi	10.1111/j.1744-7402.2010.02571.x
http://localhost/t...ganizacniJednotka	25310
is http://linked.open...avai/riv/vysledek of	Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films. Sputtering and pulsed laser deposition for near and mid-infrared applications: A comparative study of Ge25Sb10S65 and Ge25Sb10Se65 amorphous thin films.

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