About: Monte Carlo and Particle in Cell Simulation of Mirror Effect in PECVD reactor     Goto   Sponge   NotDistinct   Permalink

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Description
  • We have studied thin film plasma enhanced chemical vapor deposition from methane and thin film sputtering in argon in low pressure rf discharge. We have observed that thickness of a thin film deposited on the upper (grounded) electrode has mirrored substrates placed on the bottom rf powered electrode. This mirror images have not been quite sharp. The same effect was observed when the initially homogeneous film (deposited on the upper electrode) was sputtered in the argon plasma. Again the image of object on the bottom electrode was sputtered in the film on the upper electrode. The mirror effect has been studied via Particle In Cell - Monte Carlo (PIC-MC) computer simulation. In our explanation the mirror effect is caused by the difference between secondary electron emission coefficient of substrate material and material of substrate holder. This difference in the secondary electron emission coefficient affects plasma density upon the substrates and this leads to higher or lower deposition rate on the
  • We have studied thin film plasma enhanced chemical vapor deposition from methane and thin film sputtering in argon in low pressure rf discharge. We have observed that thickness of a thin film deposited on the upper (grounded) electrode has mirrored substrates placed on the bottom rf powered electrode. This mirror images have not been quite sharp. The same effect was observed when the initially homogeneous film (deposited on the upper electrode) was sputtered in the argon plasma. Again the image of object on the bottom electrode was sputtered in the film on the upper electrode. The mirror effect has been studied via Particle In Cell - Monte Carlo (PIC-MC) computer simulation. In our explanation the mirror effect is caused by the difference between secondary electron emission coefficient of substrate material and material of substrate holder. This difference in the secondary electron emission coefficient affects plasma density upon the substrates and this leads to higher or lower deposition rate on the (en)
  • Při studiu depozice tenkých vrstev pomocí metody PECVD byl pozorován tzv. zrcadlový jev. Zrcadlovým jevem myslíme to, že deponovaná vrstva na vrchní elektrodě odráží substrat na spodní elektrodě. Hrany obrazu nejsou zcela ostré. Tento jev jsem se snažili vzsvětli pomocí počitačových simulací, kde jako hlavní příčinu označujeme rozdílnost sekundární emise substrátů a dolní elektrody. Jako hlavní výsledek naších simulací uvádíme prostorové rozděleni sekundárních elektronů a iontů dopadajících na protější elektrodu. (cs)
Title
  • Monte Carlo a Particle in Cell simulace zrcadlového jevu v PECVD reaktoru (cs)
  • Monte Carlo and Particle in Cell Simulation of Mirror Effect in PECVD reactor
  • Monte Carlo and Particle in Cell Simulation of Mirror Effect in PECVD reactor (en)
skos:prefLabel
  • Monte Carlo a Particle in Cell simulace zrcadlového jevu v PECVD reaktoru (cs)
  • Monte Carlo and Particle in Cell Simulation of Mirror Effect in PECVD reactor
  • Monte Carlo and Particle in Cell Simulation of Mirror Effect in PECVD reactor (en)
skos:notation
  • RIV/00216224:14310/04:00011745!RIV08-GA0-14310___
http://linked.open.../vavai/riv/strany
  • 287-292
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • P(GA202/03/0827)
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 574536
http://linked.open...ai/riv/idVysledku
  • RIV/00216224:14310/04:00011745
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • Computer simulation; PECVD; Mirror effect (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...ontrolniKodProRIV
  • [840AE9E262C7]
http://linked.open...v/mistoKonaniAkce
  • Prague
http://linked.open...i/riv/mistoVydani
  • Prague, (Czech republic)
http://linked.open...i/riv/nazevZdroje
  • WDS'04 Proceedings of Contributed Papers, Part II
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...vavai/riv/projekt
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Buršíková, Vilma
  • Brzobohatý, Oto
  • Trunec, David
http://linked.open...vavai/riv/typAkce
http://linked.open.../riv/zahajeniAkce
number of pages
http://purl.org/ne...btex#hasPublisher
  • MATFYZPRESS
https://schema.org/isbn
  • 80-86732-32-0
http://localhost/t...ganizacniJednotka
  • 14310
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