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  • The article reports on mechanical properties and oxidation of amorphous Ti-Si-N films with a high content of Si reactively sputtered using a closed magnetic field dual magnetron sputtering system operating in AC pulse mode. The films were sputtered from compound targets on Si, 15330 steel and Al2O3 substrates. It was found that the Ti-Si-N films with a high content of N are X-ray amorphous and exhibit relatively high hardness H ranging from 20 to 27 GPa and high oxidation temperature achieving 1480°C for the Ti-Si-N film on the Al2O3 substrate, and Young's modulus of the films is strongly affected by mechanical properties of the substrate.
  • The article reports on mechanical properties and oxidation of amorphous Ti-Si-N films with a high content of Si reactively sputtered using a closed magnetic field dual magnetron sputtering system operating in AC pulse mode. The films were sputtered from compound targets on Si, 15330 steel and Al2O3 substrates. It was found that the Ti-Si-N films with a high content of N are X-ray amorphous and exhibit relatively high hardness H ranging from 20 to 27 GPa and high oxidation temperature achieving 1480°C for the Ti-Si-N film on the Al2O3 substrate, and Young's modulus of the films is strongly affected by mechanical properties of the substrate. (en)
  • Článek pojednává o mechanických vlastnostech a oxidaci amorfních vrstev Ti-Si-N s vysokým (>20 at.%) obsahem Si, které byly reaktivně naprášeny s použitím duálního magnetronu ve střídavém pulzním režimu a uspořádání s uzavřeným magnetickým polem. Vrstvy byly naprášeny ze skládaných Ti-Si terčů na substráty Si(100), ocel ČSN 15 330 a Al2O3. Bylo zjištěno, že (1) vrstvy Ti-Si-N s vysokým (50 at.%) obsahem N jsou amorfní a vykazují (i) poměrně vysokou tvrdost v rozmezí mezi ~20 a 27 GPa a (ii) vysokou teplotu oxidace dosahující ~1480 °C pro a-Ti-Si-N vrstvu na Al2O3 (safír) substrátu a (2) měření Youngova modulu pružnosti vrstev je výrazně ovlivněno mechanickými vlastnostmi substrátu. (cs)
Title
  • Ti-Si-N Films with a High Content of Si
  • Ti-Si-N Films with a High Content of Si (en)
  • Vrstvy Ti-Si-N s vysokým obsahem Si (cs)
skos:prefLabel
  • Ti-Si-N Films with a High Content of Si
  • Ti-Si-N Films with a High Content of Si (en)
  • Vrstvy Ti-Si-N s vysokým obsahem Si (cs)
skos:notation
  • RIV/49777513:23520/07:00000289!RIV08-MSM-23520___
http://linked.open.../vavai/riv/strany
  • 0
http://linked.open...avai/riv/aktivita
http://linked.open...avai/riv/aktivity
  • Z(MSM4977751302)
http://linked.open...iv/cisloPeriodika
  • 0
http://linked.open...vai/riv/dodaniDat
http://linked.open...aciTvurceVysledku
http://linked.open.../riv/druhVysledku
http://linked.open...iv/duvernostUdaju
http://linked.open...titaPredkladatele
http://linked.open...dnocenehoVysledku
  • 455231
http://linked.open...ai/riv/idVysledku
  • RIV/49777513:23520/07:00000289
http://linked.open...riv/jazykVysledku
http://linked.open.../riv/klicovaSlova
  • DC discharges; films; oxidation; Si content; structure; Ti-Si-N films (en)
http://linked.open.../riv/klicoveSlovo
http://linked.open...odStatuVydavatele
  • DE - Spolková republika Německo
http://linked.open...ontrolniKodProRIV
  • [154F6C4860CA]
http://linked.open...i/riv/nazevZdroje
  • Plasma Processes and Polymers
http://linked.open...in/vavai/riv/obor
http://linked.open...ichTvurcuVysledku
http://linked.open...cetTvurcuVysledku
http://linked.open...UplatneniVysledku
http://linked.open...iv/tvurceVysledku
  • Musil, Jindřich
  • Zeman, Petr
  • Dohnal, Pavel
http://linked.open...n/vavai/riv/zamer
issn
  • 1612-8850
number of pages
http://localhost/t...ganizacniJednotka
  • 23520
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