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Description
| - Mapování mechanického pnutí v tenkých křemíkových vrstvách bylo realizováno pro vrstvy nanesené na AFM křemíková raménka pomocí Ramanovské mikrospektroskopie dovolilo měnit napětí pomocí nanomanipulátorů. (cs)
- We have used plasma enhanced chemical vapor deposition (PECVD) to deposit silicon thin films (0.2–1 μm) with different crystallinity fractions on Nanosensors PtIr5 coated atomic force microscopy (AFM) cantilevers (450 x 50 x 2 μm3). Microscopic measurements of Raman scattering were used to map both internal stress and extrinsic stress induced in the films by bending the cantilevers using a nanomanipulator (Kleindiek Nanotechnik MM3A). Thanks to the excellent elasticity of the cantilevers, the films could be bent to curvature radii down to 300 lm. We observed the stress induced shift of the TO–LO phonon Raman band of more than 3 cm-1 for fully microcrystalline film corresponding to the stress 0.8 GPa. The shift of the similar film with amorphous structure was 2.5 cm-1.
- We have used plasma enhanced chemical vapor deposition (PECVD) to deposit silicon thin films (0.2–1 μm) with different crystallinity fractions on Nanosensors PtIr5 coated atomic force microscopy (AFM) cantilevers (450 x 50 x 2 μm3). Microscopic measurements of Raman scattering were used to map both internal stress and extrinsic stress induced in the films by bending the cantilevers using a nanomanipulator (Kleindiek Nanotechnik MM3A). Thanks to the excellent elasticity of the cantilevers, the films could be bent to curvature radii down to 300 lm. We observed the stress induced shift of the TO–LO phonon Raman band of more than 3 cm-1 for fully microcrystalline film corresponding to the stress 0.8 GPa. The shift of the similar film with amorphous structure was 2.5 cm-1. (en)
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Title
| - Mapping of mechanical stress in silicon thin films on silicon cantilevers by Raman microspectroscopy
- Mapping of mechanical stress in silicon thin films on silicon cantilevers by Raman microspectroscopy (en)
- Mapování mechanického pnutí v tenkých křemíkových vrstvách na křemíkových raménkách pomocí Ramanovské mikrospektroskopie (cs)
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skos:prefLabel
| - Mapping of mechanical stress in silicon thin films on silicon cantilevers by Raman microspectroscopy
- Mapping of mechanical stress in silicon thin films on silicon cantilevers by Raman microspectroscopy (en)
- Mapování mechanického pnutí v tenkých křemíkových vrstvách na křemíkových raménkách pomocí Ramanovské mikrospektroskopie (cs)
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skos:notation
| - RIV/68378271:_____/08:00320383!RIV09-AV0-68378271
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http://linked.open...avai/riv/aktivita
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http://linked.open...avai/riv/aktivity
| - P(GD202/05/H003), P(IAA1010316), P(IAA1010413), P(KAN400100701), P(KJB100100512), P(LC06040), P(LC510), Z(AV0Z10100521)
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http://linked.open...iv/cisloPeriodika
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http://linked.open...vai/riv/dodaniDat
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http://linked.open...aciTvurceVysledku
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http://linked.open.../riv/druhVysledku
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http://linked.open...iv/duvernostUdaju
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http://linked.open...titaPredkladatele
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http://linked.open...dnocenehoVysledku
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http://linked.open...ai/riv/idVysledku
| - RIV/68378271:_____/08:00320383
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http://linked.open...riv/jazykVysledku
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http://linked.open.../riv/klicovaSlova
| - silicon; solar cells; nanocrystals; photovoltaics; Raman scattering; mechanical stress relaxation (en)
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http://linked.open.../riv/klicoveSlovo
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http://linked.open...odStatuVydavatele
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http://linked.open...ontrolniKodProRIV
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http://linked.open...i/riv/nazevZdroje
| - Journal of Non-Crystalline Solids
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http://linked.open...in/vavai/riv/obor
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http://linked.open...ichTvurcuVysledku
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http://linked.open...cetTvurcuVysledku
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http://linked.open...vavai/riv/projekt
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http://linked.open...UplatneniVysledku
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http://linked.open...v/svazekPeriodika
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http://linked.open...iv/tvurceVysledku
| - Ledinský, Martin
- Fejfar, Antonín
- Stuchlík, Jiří
- Kočka, Jan
- Vetushka, Aliaksi
- Mates, Tomáš
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http://linked.open...ain/vavai/riv/wos
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http://linked.open...n/vavai/riv/zamer
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issn
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number of pages
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is http://linked.open...avai/riv/vysledek
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