. . . "5"^^ . . "93" . "Novotn\u00FD, M." . "Thin SiC x films were fabricated by hybrid laser-magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700\u00B0C. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400-1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions." . "5"^^ . "Kocourek, Tom\u00E1\u0161" . "3" . . . "Jel\u00EDnek, Miroslav" . "21460" . "Tenk\u00E9 SiCx vrstvy p\u0159ipraven\u00E9 pomoc\u00ED hybridn\u00ED laserov\u00E9 magnetronov\u00E9 depozice"@cs . "DE - Spolkov\u00E1 republika N\u011Bmecko" . "000260218400010" . . "Kadlec, J." . . "RIV/68407700:21460/08:12148102" . "Tenk\u00E9 SiCx vrstvy byly p\u0159ipraven\u00E9 pomoc\u00ED hybridn\u00ED laserov\u00E9 magnetronov\u00E9 depozice."@cs . "P(GA202/06/0216), S, Z(AV0Z10100522), Z(MSM6840770012)" . "2"^^ . . "Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition"@en . "hybrid laser-magnetron deposition; thin layer"@en . "Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition" . "399971" . "[E1B57A2979A1]" . . . "Thin SiC x films were fabricated by hybrid laser-magnetron deposition system. KrF excimer laser was used for deposition of carbon and magnetron at the same time for sputtering of Si species. Films were fabricated in argon/hydrogen ambient with and without additional RF discharge. The substrate temperature was changed up to 700\u00B0C. Films topology, crystallinity, composition, chemical bonds and optical emission spectra were studied. Films were smooth and amorphous. Films of thickness 400-1000 nm were fabricated. Adhesion moved from 8 to 14 N, depending on deposition conditions."@en . . "RIV/68407700:21460/08:12148102!RIV09-MSM-21460___" . . "Zemek, J." . "Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition"@en . "Tenk\u00E9 SiCx vrstvy p\u0159ipraven\u00E9 pomoc\u00ED hybridn\u00ED laserov\u00E9 magnetronov\u00E9 depozice"@cs . . . . "Thin SiCx Layers Prepared by Hybrid Laser-Magnetron Deposition" . . "Applied Physics A: Materials Science and Processing" . "0947-8396" . . .