. . . "116/119" . "Surface and Coatings Technology" . "Soukup, Ladislav" . . "Musil, Jind\u0159ich" . "N/A" . "Jastrab\u00EDk, Lubom\u00EDr" . "[1D608FF575BC]" . . . "9"^^ . . "Fendrych, Franti\u0161ek" . "The composition, optical and mechanical propertiesf the CNxHy films deposited at various process conditions were investigated by electron microprobe analysis, IR spectroscopy and microhardness measurements."@en . "65;73" . "CN x H y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism."@en . . . . "Shaginyan, L. R." . "N/A"@en . "P(IAA1010827), Z(AV0Z1010914)" . "4"^^ . "CN x H y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism." . "The composition, optical and mechanical propertiesf the CNxHy films deposited at various process conditions were investigated by electron microprobe analysis, IR spectroscopy and microhardness measurements." . "CH - \u0160v\u00FDcarsk\u00E1 konfederace" . "RIV/68378271:_____/99:02000057" . . . "0"^^ . "0"^^ . "Kulikovsky, V. Yu." . "CN x H y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism."@en . . "RIV/68378271:_____/99:02000057!RIV/2003/AV0/A02003/N" . . . "CN x H y films obtained by ECR plasma activated CVD: the role of substrate bias (DC, RF) and some other deposition parameters in growth mechanism." . . "0257-8972" . . "6"^^ . . "737012" .