. "Domonkos, M\u00E1ria" . . . . "Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching" . "6" . . . "27496" . . "Hru\u0161ka, Karel" . . . "Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching"@en . "Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching" . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . . "RIV/68378271:_____/14:00432632!RIV15-GA0-68378271" . "7" . "I\u017E\u00E1k, Tibor" . "6"^^ . "Kromka, Alexander" . . . . . . "Babchenko, Oleg" . . "6"^^ . . "RIV/68378271:_____/14:00432632" . "10.1166/asem.2014.1573" . "micro- and nanocrystalline diamond; capacitively coupled plasma; reactive ion etching; nanostructuring; scanning electron microscopy"@en . "Varga, Mari\u00E1n" . "Mask-free surface structuring of micro- and nanocrystalline diamond films by reactive ion plasma etching"@en . . "5"^^ . "[4D86A5CD1CBD]" . "2164-6627" . . "Advanced Science, Engineering and Medicine" . . . . "I, P(FR-TI2/736), P(GAP108/12/0910), P(GAP108/12/0996)" . "In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture." . . "Babchenko, Oleg" . "In this technologically oriented study, the mask-free surface structuring of micro- and nanocrystalline diamond thin films is presented. The structuring of diamond films was performed by the reactive ion plasma etching in capacitively coupled radiofrequency plasma using different plasma chemistries (i.e. gas mixtures: O2, CF4, SF6 and Ar). We found that employing only oxygen plasma results in the formation of diamond nanowhiskers. Adding a small amount of CF4 makes the surface flatter. Argon containing gas mixture leads to smooth diamond surface without any whiskers. The etching mechanism is discussed with respect to the primary diamond morphology (micro- vs. nano-crystalline) and the used gas mixture."@en . "I\u017E\u00E1k, Tibor" .