"Applied Surface Science" . . . . "NL - Nizozemsko" . "[730686F5BA1A]" . "Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 \u00B0C and 150 \u00B0C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers\u2019 crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties."@en . "PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers" . "000307241800047" . . . "Remsa, J." . "PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers" . "PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers"@en . . "23" . . . . . "PLD and RF discharge combination used for preparation of photocatalytic TiO2 layers"@en . . "pulsed laser deposition; titanium dioxide,; photocatalysis,; RF discharge; thin films"@en . . "Jel\u00EDnek, Miroslav" . "RIV/68378271:_____/12:00382104!RIV13-AV0-68378271" . "158923" . "http://dx.doi.org/10.1016/j.apsusc.2012.02.042" . "3"^^ . "Utilizing pulsed laser deposition technique combined with the radio-frequency discharge (between the target and the substrate), we were able to grow polycrystalline titanium dioxide layers (anatase, rutile) at substrate temperatures 85 \u00B0C and 150 \u00B0C. Besides the discharge no additional substrate heating was applied. The layers were prepared from pure titanium and titanium dioxide targets. To optimize deposition conditions, the oxygen background pressure, fluence (from 2 J cm2 to 9 J cm2), and discharge power were varied. Silicon wafers (1 1 1), fused silica, and polyethylene tubes were used as substrates. The layers\u2019 crystalline structure was determined by X-ray diffraction. Atomic force microscopy was used to characterize the surface properties." . . . . "258" . "Mik\u0161ovsk\u00FD, Jan" . . . . "2"^^ . . "0169-4332" . "RIV/68378271:_____/12:00382104" . "4"^^ . "S, Z(AV0Z10100522)" . .