"Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering" . "Hippler, R." . "10.1016/j.surfcoat.2011.11.043" . "2"^^ . "RIV/68378271:_____/12:00377074!RIV13-TA0-68378271" . . "Tich\u00FD, M." . "Wulff, H." . . "Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering"@en . . . . . . "Hubi\u010Dka, Zden\u011Bk" . "9"^^ . "\u010Cada, Martin" . "9"^^ . . "Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering" . "000301017300010" . . . . "The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode\u2013cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at the substrate position about 25\u201330 \u03BCs after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti\u2013Cu films."@en . . . . "RIV/68378271:_____/12:00377074" . "P(GA202/07/0044), P(GA202/09/0800), P(GAP205/11/0386), P(GP202/09/P159), P(TA01010517), Z(AV0Z10100522)" . . . . "CH - \u0160v\u00FDcarsk\u00E1 konfederace" . "Drache, S." . "Bogdanowicz, R." . "206" . "11-12" . . . "Surface and Coatings Technology" . "The present paper is focused on time-resolved diagnostics of the simultaneous combination of dual mid frequency and dual-high power impulse magnetron sputtering discharges (so-called hybrid-dual-HiPIMS systems). The magnetrons in dual configuration are electrically confined, i.e. electrodes are alternately operated as an anode\u2013cathode (and vice versa) during the sputtering. The dual MF discharge causes a pre-ionization effect which is an important feature because of: (i) a significant reduction of the working pressure by more than one order of magnitude, (ii) an increase of electron and ion energy, and (iii) an increase of the deposition rate. The time-resolved IVDF measurements revealed that ions with high energy generated at the cathode arrive at the substrate position about 25\u201330 \u03BCs after the HiPIMS pulse ignition. The effect of the hybrid system is illustrated on the deposition of Ti\u2013Cu films." . "Stra\u0148\u00E1k, V." . "dual magnetron; HiPIMS; MF discharge; Ti-Cu films; IVDF; XRD"@en . "Herrendorf, A.-P." . "0257-8972" . . "Effect of mid-frequency discharge assistance on dual-high power impulse magnetron sputtering"@en . . . "[C89FAAFE47A1]" . . . "133151" . . .