"[09E0DFD52C47]" . "Pokorn\u00FD, Petr" . . "1612-8850" . "Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina"@en . "DE - Spolkov\u00E1 republika N\u011Bmecko" . . . "Musil, Jind\u0159ich" . "Plasma Processes and Polymers" . . . . . "aluminium oxide; ion-energy distribution function; magnetron; mass spectrometry; pulsed discharges"@en . . "7" . "Bul\u00ED\u0159, Ji\u0159\u00ED" . "Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina" . . . "5"^^ . . "Lan\u010Dok, J\u00E1n" . . . . . . . "000285212000004" . "RIV/68378271:_____/10:00351378" . "Novotn\u00FD, Michal" . "Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina" . . . "RIV/68378271:_____/10:00351378!RIV11-GA0-68378271" . . . . "260359" . . "P(GP202/09/P324), P(IAA100100718), P(KAN400100653), Z(AV0Z10100522)" . "5"^^ . . "11" . "Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina"@en . "The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate \u03C6O2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates \u03C6O2=\u03C6Ar. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films." . . "The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode of sputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate \u03C6O2, magnetron voltage Ud and constant power Pd=400W delivered to the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates \u03C6O2=\u03C6Ar. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films."@en . "5"^^ .