. . "5"^^ . . . "Hydrogen-free amorphous silicon (a-Si) films were prepared by magnetron sputtering of pure silicon. Mechanical properties (hardness, intrinsic stress, elastic modulus), and film structure (Raman spectra, electron diffraction) were investigated in dependence on the substrate bias and temperature. The increasing negative substrate bias or Ar pressure results in simultaneous reducing compressive stress, the film hardness and elastic modulus. The crystalline structure (c-Si) starts to be formed at deposition temperature of 700 \u00B0C. The hardness and elastic modulus of c-Si films were very close to monocrystalline Si(111). Phase transformations observed in the samples at indentation depend not only on the load and loading rate but also on the initial phase of silicon. However, the film hardness is not too sensitive to the presence of phase transformations."@en . . "Mechanical properties of amorphous and microcrystalline silicon films" . "16" . "Mechanick\u00E9 vlastnosti amorfn\u00EDch a mikrokrystalick\u00FDch k\u0159em\u00EDkov\u00FDch vrstev"@cs . "Filmy amorfn\u00EDho k\u0159em\u00EDku (a-Si) byly p\u0159ipraveny magnetronov\u00FDm napra\u0161ov\u00E1n\u00EDm \u010Dist\u00E9ho k\u0159em\u00EDku. Mechanick\u00E9 vlastnosti (Tvrdost, vnit\u0159n\u00ED pnut\u00ED, elastick\u00FD modul) a struktura filmu (Ramanova spektra, elektronov\u00E1 difrakce) byla zkoum\u00E1na v z\u00E1vislosti na teplot\u011B substr\u00E1tu a %22bias%22. Vzr\u016Fst negativn\u00EDho %22bias%22 nebo tlaku Ar vede k sou\u010Dasn\u00E9 redukci vnit\u0159n\u00EDch pnut\u00ED, tvrdosti a elastick\u00E9ho modulu. Krystalick\u00E1 struktura (c-Si) se za\u010D\u00EDn\u00E1 formovat p\u0159i depozi\u010Dn\u00ED teplot\u011B 700 \u00B0C. Tvrdost a elastick\u00FD modul c-Si film\u016F se bl\u00ED\u017E\u00ED monokrystalick\u00E9mu k\u0159em\u00EDku (111). Pozorovan\u00E1 f\u00E1zov\u00E1 transformace p\u0159i indentaci nez\u00E1vis\u00ED jen na z\u00E1t\u011B\u017En\u00E9 s\u00EDle a jej\u00ED rychlosti r\u00E1stu, ale t\u00E9\u017E na p\u016Fvodn\u00ED f\u00E1zi Si. Tvrdost t\u011Bchto film\u016F nen\u00ED v\u0161ak v\u00FDrazn\u011B citliv\u00E1 na tutu f\u00E1zovou transformaci."@cs . "Mechanical properties of amorphous and microcrystalline silicon films"@en . "8"^^ . . "000257452200046" . "Mechanick\u00E9 vlastnosti amorfn\u00EDch a mikrokrystalick\u00FDch k\u0159em\u00EDkov\u00FDch vrstev"@cs . . . "[E9DC3FC6D597]" . . "\u010Ctvrtl\u00EDk, Radim" . . "378257" . . . "CH - \u0160v\u00FDcarsk\u00E1 konfederace" . "RIV/68378271:_____/08:00321380" . "RIV/68378271:_____/08:00321380!RIV09-AV0-68378271" . . . "Kulykovskyy, Valeriy" . "P(1M06002), P(KAN301370701), Z(AV0Z10100520), Z(AV0Z10100522)" . . . "516" . "0040-6090" . . "Strany\u00E1nek, Martin" . . "Vorl\u00ED\u010Dek, Vladim\u00EDr" . . "Mechanical properties of amorphous and microcrystalline silicon films" . "Kurdyumov, A." . "Mechanical properties of amorphous and microcrystalline silicon films"@en . . . "6"^^ . . "Thin Solid Films" . "a-Si films; hardness; elastic modulus; compressive stress; Raman spectra"@en . "Hydrogen-free amorphous silicon (a-Si) films were prepared by magnetron sputtering of pure silicon. Mechanical properties (hardness, intrinsic stress, elastic modulus), and film structure (Raman spectra, electron diffraction) were investigated in dependence on the substrate bias and temperature. The increasing negative substrate bias or Ar pressure results in simultaneous reducing compressive stress, the film hardness and elastic modulus. The crystalline structure (c-Si) starts to be formed at deposition temperature of 700 \u00B0C. The hardness and elastic modulus of c-Si films were very close to monocrystalline Si(111). Phase transformations observed in the samples at indentation depend not only on the load and loading rate but also on the initial phase of silicon. However, the film hardness is not too sensitive to the presence of phase transformations." . . . . "Boh\u00E1\u010D, Petr" .