"Kadlec, J." . . "Tenk\u00E9 vrstvy TiCN p\u0159ipraven\u00E9 hybridn\u00ED magnetron- laserovou depozic\u00ED"@cs . "Tenk\u00E9 vrstvy TiCN p\u0159ipraven\u00E9 hybridn\u00ED magnetron- laserovou depozic\u00ED"@cs . . "Santoni, A." . "-" . . . "Thin TiCN films prepared by hybrid magnetron-laser deposition"@en . "1612-8850" . "RIV/68378271:_____/07:00086725" . "RIV/68378271:_____/07:00086725!RIV08-AV0-68378271" . . . "Kocourek, Tom\u00E1\u0161" . . . . "Thin TiCN films prepared by hybrid magnetron-laser deposition" . "[3D8F8656AFF2]" . "Titan-karbonitridov\u00E9 vrstvy byly p\u0159ipraveny hybridn\u00EDm depozi\u010Dn\u00EDm syst\u00E9mem kombinuj\u00EDc\u00EDm DC magnetron a KrF laser. Vrstvy byly p\u0159ipraveny za pokojov\u00E9 teploty a v dus\u00EDkov\u00E9m okol\u00ED p\u0159i hustot\u011B laserov\u00E9 energie 15 Jcm-2 a v\u00FDkonu magnetronu 150 W. Vrstvy byly charakterizov\u00E1ny metodami XRD, GDOES a XPS."@cs . "Plasma Processes and Polymers" . . . "5"^^ . "Jel\u00EDnek, Miroslav" . . "Popov, C." . "4" . "P(GA202/06/0216), Z(AV0Z10100522)" . "Thin TiCN films prepared by hybrid magnetron-laser deposition"@en . "5651;5654" . "DE - Spolkov\u00E1 republika N\u011Bmecko" . . "2"^^ . "Titanium carbonitride thin films were prepared by hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition. Carbon and titanium species were simultaneously deposited on the same rotated Si substrate. Films were fabricated at room substrate temperature in argon-nitrogen ambient atmosphere, for laser fluence of 15 J.cm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Films were studied by XRD and glow discharge optical emission spectroscopy (GDOES). Mechanical and electronic properties (XPS) were also measured." . . "Thin TiCN films prepared by hybrid magnetron-laser deposition" . . "laser deposition; magnetron; radio frequency discharge; thin films; TiCN"@en . . . . . "455115" . "Titanium carbonitride thin films were prepared by hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition. Carbon and titanium species were simultaneously deposited on the same rotated Si substrate. Films were fabricated at room substrate temperature in argon-nitrogen ambient atmosphere, for laser fluence of 15 J.cm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Films were studied by XRD and glow discharge optical emission spectroscopy (GDOES). Mechanical and electronic properties (XPS) were also measured."@en . "4"^^ . .