"SPIE" . . "laser deposition; magnetron; radiofrequency discharge; TiCN; thin films"@en . . "Studie tenk\u00FDch TiCxN1-x vrstev vyroben\u00FDch hybridn\u00ED magnetron-laserovou depozic\u00ED"@cs . "Titanium-carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited an the same Si substrate dimensions of 3 x 3 cm. Films were fabricated in argon-nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of Jcm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES)." . . . . "Study of thin TiCxN1-x films fabricated by hybrid magnetron-laser deposition"@en . "Study of thin TiCxN1-x films fabricated by hybrid magnetron-laser deposition" . "Studni\u010Dka, V\u00E1clav" . . . "0-8194-6213-6" . "4"^^ . "Kadlec, J." . . "Bellingham" . "Titan-karbonitridov\u00E9 tenk\u00E9 vrstvy byly deponov\u00E1ny p\u0159i pokojov\u00E9 teplot\u011B hybridn\u00ED depozic\u00ED kombinuj\u00EDc\u00ED DC magnetron a KrF laserovou depozici. Bylo deponov\u00E1no v dus\u00EDkov\u00E9 atmosf\u00E9\u0159e 1 Pa - 5 Pa, hustota laserov\u00E9 energie 15 Jcm-2 a v\u00FDkon magnetronu 150 W. Bylo studov\u00E1no slo\u017Een\u00ED vrstvy a XRD."@cs . "3"^^ . . "2005-06-08+02:00"^^ . "[1532EEC4AB55]" . "545296" . "Study of thin TiCxN1-x films fabricated by hybrid magnetron-laser deposition" . "5"^^ . . "Jel\u00EDnek, Miroslav" . "P(IAA1010110), Z(AV0Z10100522)" . "61800G/1;61800G/5" . "Study of thin TiCxN1-x films fabricated by hybrid magnetron-laser deposition"@en . . "Kocourek, Tom\u00E1\u0161" . . "Titanium-carbonitride thin films were grown at room temperature using a hybrid deposition arrangement combining DC magnetron sputtering and KrF pulsed laser deposition (MSPLD). Carbon and titanium were simultaneously deposited an the same Si substrate dimensions of 3 x 3 cm. Films were fabricated in argon-nitrogen atmosphere of 1 Pa - 5 Pa, for laser fluence of Jcm-2 and magnetron power of 150 W. Film properties were modified by RF discharge held between the target and substrate. Film crystallinity was studied by XRD and the composition depth profile of TiCN layers by glow discharge optical emission spectroscopy (GDOES)."@en . . "RIV/68378271:_____/05:00041223" . . "Studie tenk\u00FDch TiCxN1-x vrstev vyroben\u00FDch hybridn\u00ED magnetron-laserovou depozic\u00ED"@cs . "Prague" . . . . . . "Proceeding of SPIE - Int. Connference on Lasers, Applications, and Technologies 2005. Laser-Assisted Micro- and Nanotechnologies" . . "RIV/68378271:_____/05:00041223!RIV07-AV0-68378271" . . .