"Opole-Turawa" . . . "2005-09-06+02:00"^^ . . . "Investigation of plasma produced by high-energy low-intesity laser pulses for implantation of Ge ions into Si and SiO2 substrates" . "In this contribution we describe the characterization and optimization of laser-produced Ge ion fluxes as well as analysis of the direct implantation of these ions into Si and SiO2 substrates at the PALS. The Ge target was irradiated using laser pulses of energy up to 50 J. The maximum depth of implantation of Ge ions was ~450nm."@en . . "525615" . . "[1267E09FF2C3]" . "0094-243X" . "In this contribution we describe the characterization and optimization of laser-produced Ge ion fluxes as well as analysis of the direct implantation of these ions into Si and SiO2 substrates at the PALS. The Ge target was irradiated using laser pulses of energy up to 50 J. The maximum depth of implantation of Ge ions was ~450nm." . "Studium plazmatu produkovan\u00E9ho laserov\u00FDmi pulsy o vysok\u00E9 energii a n\u00EDzk\u00E9 intenzit\u011B pro implantaci Ge iont\u016F do Si a SiO2 podlo\u017Eek"@cs . "Ullschmied, Ji\u0159\u00ED" . . "Rohlena, Karel" . "laser plasma; Ge ions; laser implantation"@en . "Torrisi, L." . "Pfeifer, Miroslav" . . "L\u00E1ska, Leo\u0161" . . "American Institut of Physics" . "Wolowski, J." . "4"^^ . . "RIV/68378271:_____/05:00031345!RIV06-AV0-68378271" . "Studium plazmatu produkovan\u00E9ho laserov\u00FDmi pulsy o vysok\u00E9 energii a n\u00EDzk\u00E9 intenzit\u011B pro implantaci Ge iont\u016F do Si a SiO2 podlo\u017Eek"@cs . . "Kr\u00E1sa, Josef" . . "RIV/68378271:_____/05:00031345" . "Parys, P." . . "303;306" . . "Mezzasalma, A." . "Z(AV0Z10100523)" . . "Melville" . "Investigation of plasma produced by high-energy low-intesity laser pulses for implantation of Ge ions into Si and SiO2 substrates"@en . "Investigation of plasma produced by high-energy low-intesity laser pulses for implantation of Ge ions into Si and SiO2 substrates" . "6"^^ . . "PLASMA 2005: Int. Conf. on Research and Applications of Plasmas; 3rd German-Polish Conf.on Plasma Diagnostics for Fusion and Applications; 5th French-Polish Seminar on Thermal Plasma in Space and Labo" . "Rosinski, M." . "Boody, F. P." . . "13"^^ . "Badziak, J." . "Investigation of plasma produced by high-energy low-intesity laser pulses for implantation of Ge ions into Si and SiO2 substrates"@en . . . "Gammino, S." . "V tomto p\u0159\u00EDsp\u011Bvku je charakterizov\u00E1n optimalizovan\u00FD tok Ge iont\u016F, z\u00EDskan\u00FD oz\u00E1\u0159en\u00EDm Ge ter\u010D\u00EDku pulsy jodov\u00E9ho laseru PALS o energi\u00EDch do 50 J, a analyzov\u00E1na p\u0159\u00EDm\u00E1 implantace t\u011Bchto iont\u016F do Si a SiO2 podlo\u017Eek. Maxim\u00E1ln\u00ED hloubka implantace Ge iont\u016F byla ~450nm."@cs .