"0003-6951" . "86" . . "Pelka, B." . "RIV/68378271:_____/05:00025952" . "RIV/68378271:_____/05:00025952!RIV06-AV0-68378271" . "Pientka, Zbyn\u011Bk" . "3" . . . "ablation; XUV laser; capillary discharge laser"@en . "Juha, Libor" . "Krzywinski, J." . . "Ullschmied, Ji\u0159\u00ED" . "Bittner, Michal" . "Vaschenko, G. O." . "Pr\u00E4g R., Ansgar" . "034109/1;034109/3" . "Ot\u010Den\u00E1\u0161ek, Zden\u011Bk" . "15"^^ . . "Rocca, J. J." . "US - Spojen\u00E9 st\u00E1ty americk\u00E9" . "P(1P04LA235), P(LN00A100), Z(AV0Z10100523)" . . "Grisham, M. E." . "Ablation of organic polymers by 46.9-nm-laser radiation"@en . "3"^^ . "[C2B6E1A68554]" . "Z\u00E1\u0159en\u00ED z neonu-podobn\u00E9ho argonov\u00E9ho XUV laseru (?= 46,9 nm, ?= 1,2 ns) na kapil\u00E1rn\u00EDm v\u00FDboji bylo fokusov\u00E1no kulov\u00FDm Sc/Si mnohovrstv\u00FDm zrcadlem aby ablaovalo polymethylmetakryl\u00E1t, polytetrafluoroethylen a polyimid. V\u0161echny t\u0159i materi\u00E1ly se za dan\u00FDch podm\u00EDnek ablaovaly s velmi podobnou \u00FA\u010Dinnost\u00ED"@cs . . "6"^^ . "511187" . . . "Wawro, A." . . "Ablation of organic polymers by 46.9-nm-laser radiation"@en . . . . . "Ablace organick\u00FDch polymer\u016F laserov\u00FDm z\u00E1\u0159en\u00EDm o vlnov\u00E9 d\u00E9lce 46,9 nm"@cs . . "We report results of the exposure of poly(tetrafluorethylene)-(PTFE), poly(methyl methacrylate)-(PMMA), and polymide-(PI) to intense 46.9 nm-laser pulses of 1.2-ns-duration at fluences raging from ~ 0.1 to ~ 10J/cm2"@en . "Ablation of organic polymers by 46.9-nm-laser radiation" . "Applied Physics Letters" . . . . "Kr\u00E1sa, Josef" . "Menoni, C. S." . "Ablation of organic polymers by 46.9-nm-laser radiation" . "We report results of the exposure of poly(tetrafluorethylene)-(PTFE), poly(methyl methacrylate)-(PMMA), and polymide-(PI) to intense 46.9 nm-laser pulses of 1.2-ns-duration at fluences raging from ~ 0.1 to ~ 10J/cm2" . . . . "Chvostov\u00E1, Dagmar" . . "Ablace organick\u00FDch polymer\u016F laserov\u00FDm z\u00E1\u0159en\u00EDm o vlnov\u00E9 d\u00E9lce 46,9 nm"@cs . .