"Kr\u00E1sa, Josef" . "The laser-produced plasma has been used as a source of ions with different charge states and with different kinetic energies for ion implantation into various materials: metals, polymers and semiconductors, in order to modify their properties. The implantation depth was measured using Rutherford backscattering spectroscopy (RBS)"@en . "Badziak, J." . "Application of laser ion source for ion implantation technology"@en . "Laserov\u00E9 plazma bylo vyu\u017Eito jako zdroj iont\u016F o r\u016Fzn\u00FDch n\u00E1bojov\u00FDch \u010D\u00EDslech a s r\u016Fznou kinetickou energi\u00ED pro implantaci iont\u016F do r\u016Fzn\u00FDch materi\u00E1l\u016F (kov\u016F, polymer\u016F a polovodi\u010D\u016F) s c\u00EDlem modifikovat jejich vlastnosti. Hloubka implantace byla m\u011B\u0159ena RBS spektroskopi\u00ED (Rutheford\u016Fv zp\u011Btn\u00FD rozptyl)"@cs . "The laser-produced plasma has been used as a source of ions with different charge states and with different kinetic energies for ion implantation into various materials: metals, polymers and semiconductors, in order to modify their properties. The implantation depth was measured using Rutherford backscattering spectroscopy (RBS)" . "Gammino, S." . "78" . . "Hora, H." . "4"^^ . "-" . "[0939965FA194]" . . "3"^^ . . "Mezzasalma, A. M." . . "laser-matter interaction; laser ion source"@en . "Application of laser ion source for ion implantation technology" . "0042-207X" . . "GB - Spojen\u00E9 kr\u00E1lovstv\u00ED Velk\u00E9 Brit\u00E1nie a Severn\u00EDho Irska" . . "Rohlena, Karel" . "Torrisi, L." . "Ullschmied, Ji\u0159\u00ED" . "Application of laser ion source for ion implantation technology"@en . "Boody, F. P." . . "Rosinski, M." . "14"^^ . "512837" . . . "Wolowski, J." . . "Z(AV0Z10100523)" . "Pou\u017Eit\u00ED laserov\u00E9ho zdroje iont\u016F pro technologii iontov\u00E9 implantace"@cs . . "Woryna, E." . "L\u00E1ska, Leo\u0161" . . . "435;438" . "RIV/68378271:_____/05:00025514!RIV06-AV0-68378271" . . "Application of laser ion source for ion implantation technology" . . "Parys, P." . "Vacuum" . "RIV/68378271:_____/05:00025514" . . "Pou\u017Eit\u00ED laserov\u00E9ho zdroje iont\u016F pro technologii iontov\u00E9 implantace"@cs .