"RIV/68378271:_____/04:00110177!RIV/2005/AV0/A02005/N" . "Georgiev, G." . . "469-470" . "Zkoum\u00E1n\u00ED mechanismu r\u016Fstu a struktury nanokrystalick\u00FDch diamantov\u00FDch vrstev pomoc\u00ED rychl\u00E9ho tepeln\u00E9ho \u017E\u00EDh\u00E1n\u00ED"@cs . "0040-6090" . . "Investigation of the growth mechanism and structure of nanocrystalline diamond films by rapid thermal annealing" . "Investigation of the growth mechanism and structure of nanocrystalline diamond films by rapid thermal annealing"@en . "7"^^ . "6"^^ . "CH - \u0160v\u00FDcarsk\u00E1 konfederace" . "nanocrystalline diamond; annealing; growth mechanism; structural properties"@en . . . "Vrstvy nanokrystalick\u00E9ho diamantu(NCD) v amorfn\u00ED matrici p\u0159ipraven\u00E9 standardn\u00ED plazmochemickou deposic\u00ED. N\u011Bkter\u00E9 z nich byly podrobeny rychl\u00E9mu tepeln\u00E9mu \u017E\u00EDh\u00E1n\u00ED (RTA) p\u0159i 1100 a 1400 oC. Charakterizace pomoc\u00ED skenovac\u00ED elektronov\u00E9 mikrosopie (SEM), rentgenov\u00E9 difrakce (XRD), Ramanovy spektroskopie a fourierovsk\u00E9 infra\u010Derven\u00E9 spektroskopie (FTIR). Ztr\u00E1ta materi\u00E1lu p\u0159i \u017E\u00EDh\u00E1n\u00ED struktura do 1100 oC nezm\u011Bn\u011Bna; p\u0159i 1400 oC tvorba krystalick\u00E9 slitiny SiCxNyOz. R\u016Fst NDC je charakterizov\u00E1n n\u00EDzkou prim\u00E1rn\u00ED hustotou nukleace a velmi vysokou sekund\u00E1rn\u00ED nuklea\u010Dn\u00ED rychlost\u00ED."@cs . "Kulich, W." . . "[8D09A888C460]" . "Vorl\u00ED\u010Dek, Vladim\u00EDr" . . . "Boycheva, S." . . . "Thin Solid Films" . "Investigation of the growth mechanism and structure of nanocrystalline diamond films by rapid thermal annealing"@en . "568924" . "Zkoum\u00E1n\u00ED mechanismu r\u016Fstu a struktury nanokrystalick\u00FDch diamantov\u00FDch vrstev pomoc\u00ED rychl\u00E9ho tepeln\u00E9ho \u017E\u00EDh\u00E1n\u00ED"@cs . "Z(AV0Z1010914)" . "Nanocrystalline diamond (NCD) films in an amorphous matrix microwave plasma chemical vapour deposition some of the coatings have been subjected to rapid thermal annealing. Characterization scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy and Fourier transform infrared spectroscopy(FTIR).Low primary nucleation density but very high secondary nucleation rate." . "RIV/68378271:_____/04:00110177" . "99;104" . "-" . "Investigation of the growth mechanism and structure of nanocrystalline diamond films by rapid thermal annealing" . . "Gibson, P. N." . . "Nanocrystalline diamond (NCD) films in an amorphous matrix microwave plasma chemical vapour deposition some of the coatings have been subjected to rapid thermal annealing. Characterization scanning electron microscopy (SEM), X-ray diffraction (XRD), Raman spectroscopy and Fourier transform infrared spectroscopy(FTIR).Low primary nucleation density but very high secondary nucleation rate."@en . . "Popov, C." . . . "Beshkov, G." . . . "1"^^ .