. . . "NL - Nizozemsko" . . "RIV/68378271:_____/03:02030166" . "In the present paper the investigation of the energy and composition of the positive and negative ion flux towards a substrate during reactive magnetron sputter-deposition of Ti-C:H films is reported.The energy distributions, mass spectra fluxes of the positive and negative ions were measured for various compositions and total pressure of the working mixture." . . "Surface and Coating Technology" . . . . "1"^^ . "Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films." . . . "601872" . . . "[06844DDE4168]" . "53;56" . "0"^^ . "1"^^ . "0"^^ . "Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films."@en . . . . "169-170" . "4"^^ . "P(GA106/99/D086), P(ME 455), Z(AV0Z1010914)" . "RIV/68378271:_____/03:02030166!RIV/2004/AV0/A02004/N" . . . "N/A" . "Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films." . "magnetron; reactive sputtering; titanium carbide; metan; argon"@en . . . "0257-8972" . "In the present paper the investigation of the energy and composition of the positive and negative ion flux towards a substrate during reactive magnetron sputter-deposition of Ti-C:H films is reported.The energy distributions, mass spectra fluxes of the positive and negative ions were measured for various compositions and total pressure of the working mixture."@en . "Composition and energy of the flux of positive and negative ions during reactive magnetron sputter deposition of Ti-C:H films."@en . . "Mi\u0161ina, Martin" .