"261;267" . "123" . . . . "0257-8972" . . "Soukup, Ladislav" . "RIV/68378271:_____/00:02010098" . "N/A"@en . . "Jastrab\u00EDk, Lubom\u00EDr" . "Onoprienko, A. A." . . . "[754DE55DFA9F]" . . "P(IAA1010827), P(IPP1010912), Z(AV0Z1010914)" . . . "Shaginyan, L. R." . . "N/A" . . "Hydrogenated carbon nitride and carbon nitride films were deposited by ECR plasma-assisted CVD and rf reactive magnetron sputtering. Film composition(N/C ratio), growth rate (Vg) and microhardness bias in the range 0 to 200V. As was revealed, the ion bombardment influences the composition and growth rate of carbon nitride films during their deposition."@en . . "Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering."@en . "Surface and Coatings Technology" . "Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering."@en . . . "Hydrogenated carbon nitride and carbon nitride films were deposited by ECR plasma-assisted CVD and rf reactive magnetron sputtering. Film composition(N/C ratio), growth rate (Vg) and microhardness bias in the range 0 to 200V. As was revealed, the ion bombardment influences the composition and growth rate of carbon nitride films during their deposition." . "2"^^ . "Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering." . "0"^^ . "4"^^ . "Deposition conditions and composition and structure relationships for nitride carbon films obtained by ECR plasma-assisted CVD and reactive rf magnetron sputtering." . "0"^^ . "708251" . . "7"^^ . . "RIV/68378271:_____/00:02010098!RIV/2003/AV0/A02003/N" . "NL - Nizozemsko" .