"Lift-Off technique using different e-beam writers" . "5"^^ . . "Lift-Off technique using different e-beam writers"@en . "I, P(ED0017/01/01), P(EE.2.3.20.0103), P(TE01020233)" . "Chlumsk\u00E1, Jana" . "Lift\u2013Off; electron-beam lithography; e\u2013beam writers with shaped and Gaussian beam"@en . . "This paper deals with lift\u2013off technique performed by the way of electron beam lithography. Lift\u2013off is a technique mainly used for preparation of metallic patterns and unlike etching it is an additive technique using a sacrificial material \u2013 e.g. e\u2013beam resist PMMA. In this paper we discussed technique of preparation of lift\u2013off mask on two different e\u2013beam writing systems. The first system was BS600 \u2013 e\u2013beam writer with rectangular variable shaped beam working with 15keV. The second system was Vistec EBPG5000+ HR \u2013 e\u2013beam writer with Gaussian shape beam working with 50 keV and 100 keV. The PMMA resist single layer and bi\u2013layer was used for the lift\u2013off mask preparation. As a material for creation of metallic pattern, magnetron sputtered chromium was used. Atomic force microscope, scanning electron microscope and contact profilometer were used to measure and evaluate the results of this process." . "[2D8F96F9E6FF]" . "Lift-Off technique using different e-beam writers" . . "Kola\u0159\u00EDk, Vladim\u00EDr" . . "Hor\u00E1\u010Dek, Miroslav" . "Brno" . . "978-80-87294-47-5" . "RIV/68081731:_____/13:00429790" . "Mat\u011Bjka, Milan" . . "84927" . . . . "2013-10-16+02:00"^^ . . "This paper deals with lift\u2013off technique performed by the way of electron beam lithography. Lift\u2013off is a technique mainly used for preparation of metallic patterns and unlike etching it is an additive technique using a sacrificial material \u2013 e.g. e\u2013beam resist PMMA. In this paper we discussed technique of preparation of lift\u2013off mask on two different e\u2013beam writing systems. The first system was BS600 \u2013 e\u2013beam writer with rectangular variable shaped beam working with 15keV. The second system was Vistec EBPG5000+ HR \u2013 e\u2013beam writer with Gaussian shape beam working with 50 keV and 100 keV. The PMMA resist single layer and bi\u2013layer was used for the lift\u2013off mask preparation. As a material for creation of metallic pattern, magnetron sputtered chromium was used. Atomic force microscope, scanning electron microscope and contact profilometer were used to measure and evaluate the results of this process."@en . . . . "Ostrava" . . "Kr\u00E1tk\u00FD, Stanislav" . . "6"^^ . "Urb\u00E1nek, Michal" . "RIV/68081731:_____/13:00429790!RIV15-TA0-68081731" . . . . "Lift-Off technique using different e-beam writers"@en . . . "TANGER Ltd" . "NANOCON 2013. 5th International conference proceedings" . . . "6"^^ . . .